Choline bicarbonate, ~80% in H2O

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: Choline bicarbonate, ~80% in H2O
• 英文别名: carbonic acid;2-hydroxyethyl(trimethyl)azanium
• 化学式: C6H16NO4+
• mdl: MFCD00031689
• 分子量: 166.2
• InChiKey: DQKGOGJIOHUEGK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -4.66
• 重原子数：
  11
• 可旋转键数：
  2
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.833
• 拓扑面积：
  77.8
• 氢给体数：
  3
• 氢受体数：
  4

文献信息

• Ionic liquids and their use as solvents
  申请人：——

  公开号：US20040097755A1

  公开（公告）日：2004-05-20

  Ionic compounds with a freezing point of up to 100° C. are formed by the reaction of an one amine salt of formula (I) R 1 R 2 R 3 R 4 N + X − , such as choline chloride with an organic compound (II) capable of forming a hydrogen bond with X; such as urea, wherein the molar ration of I to II is from 1:1.5 to 1:2.5. R 1 , R 2 , R 3 and R 4 may be H, optionally substituted C 1 to C 5 alkyl, optionally substituted C 6 to C 10 cycloalkyl, optionally substituted C 6 to C 12 aryl, optionally substituted C 7 to C 12 alkaryl, or R 1 and R 2 taken together may represent a C 4 to C 10 optionally substituted alkylene group, thereby forming with the N atom of formula I a 5 to 11-membered heterocyclic ring and all of R 1 , R 2 , R 3 and R 4 are not identical, X − may be NO 3 − , F, Cl − , Br − , I − , BF 4 − , ClO 4 − , CN − , SO 3 CF 3 − , or COOCF 3 − . The ionic compounds are useful as solvents, and electrolytes for example in electroplating, electrowinning, and electropolishing, and as catalysts.

  通过将具有冰点高达100°C的离子化合物的制备方法，反应一个胺盐（化学式（I）R1R2R3R4N+X−，例如氯甲基胆碱）与一个有能力与X形成氢键的有机化合物（化学式（II），例如尿素），其中I与II的摩尔比为1:1.5至1:2.5。R1、R2、R3和R4可以是H，也可以是选择性取代的C1到C5烷基，选择性取代的C6到C10环烷基，选择性取代的C6到C12芳基，选择性取代的C7到C12烷芳基，或者R1和R2一起可以代表一个C4到C10可选择取代的亚烷基基团，从而与化学式I的N原子形成一个5到11成员的杂环环，并且R1、R2、R3和R4中的所有成员不相同，X−可以是NO3−、F、Cl−、Br−、I−、BF4−、ClO4−、CN−、SO3CF3−或COOCF3−。这些离子化合物可用作溶剂和电解质，例如在电镀、电解和电化学抛光中，还可用作催化剂。
• Cleaning liquid for producing semiconductor device and process for producing semiconductor device using same
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：EP0827188A2

  公开（公告）日：1998-03-04

  There is disclosed a cleaning liquid for producing a semiconductor device which comprises (A) fluorine-containing compound; (B) water-soluble or water-miscible organic solvent; and (C) inorganic acid and/or organic acid, optionally, further comprises (D) quaternary ammonium salt or (D') a specific organic carboxylic acid ammonium salt and/or an organic carboxylic acid amine salt; as well as a process for producing a semiconductor device by forming a resist pattern on a substrate equipped on the surface with an insulating film layer or a metallic electroconductive layer, forming a via hole or electric wiring by dry etching, removing the resist pattern by ashing treatment with oxygen plasma; and effecting an cleaning treatment with the above cleaning liquid. The above cleaning liquid and production process can readily remove the deposit polymer formed in the case of dry etching without impairing metallic film and insulating film.

  本发明公开了一种用于生产半导体器件的清洗液，其包括(A)含氟化合物；(B)水溶性或水混溶性有机溶剂；以及(C)无机酸和/或有机酸，可选地，还包括(D)季铵盐或(D')特定有机羧酸铵盐和/或有机羧酸胺盐；以及一种半导体器件的生产工艺，在表面装有绝缘膜层或金属导电层的基片上形成抗蚀图案，通过干法蚀刻形成通孔或电线，通过氧等离子体灰化处理去除抗蚀图案，并用上述清洗液进行清洗处理。上述清洗液和生产工艺可轻松去除干法蚀刻时形成的沉积聚合物，而不会损害金属膜和绝缘膜。
• Resist stripper
  申请人：Tosoh Corporation

  公开号：EP1211563A1

  公开（公告）日：2002-06-05

  A resist stripper which comprises a peroxide and a quaternary ammonium salt.

  一种抗蚀剂剥离剂，由过氧化物和季铵盐组成。
• IONIC LIQUIDS AND THEIR USE AS SOLVENTS
  申请人：Scionix Limited

  公开号：EP1324979A2

  公开（公告）日：2003-07-09
• A PROCESS FOR PREPARING 4-AMINODIPHENYLAMINE
  申请人：Sinorgchem Co., Shandong

  公开号：EP1591438B1

  公开（公告）日：2007-11-21