5-sec-butylpyrogallol | 56707-65-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 酚类
• 英文名称: 5-sec-butylpyrogallol
• 英文别名: 5-butan-2-ylbenzene-1,2,3-triol
• CAS: 56707-65-4
• 化学式: C₁₀H₁₄O₃
• 分子量: 182.219
• InChiKey: HCJPMTKNALLGJE-UHFFFAOYSA-N

物化性质

• 沸点：
  354.8±37.0 °C(Predicted)
• 密度：
  1.204±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.5
• 重原子数：
  13
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  60.7
• 氢给体数：
  3
• 氢受体数：
  3

文献信息

• POSITIVE-TYPE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, PHOTO-REACTIVE QUENCHER, AND POLYMERIC COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20160376233A1

  公开（公告）日：2016-12-29

  A positive-type resist composition which generates an acid upon exposure and whose solubility in an alkali developing solution increases under the action of an acid, the composition including a base material component whose solubility in an alkali developing solution increases under the action of an acid; and a compound represented by the following general formula (m0): Z 01 to Z 04 each independently represent a substituent having electron withdrawing properties, Rb 21 and Rb 22 each independently represent an alkyl group, an alicyclic hydrocarbon group which may have a substituent, or a hydroxyl group, Rb 1 represents an aryl group which may have a substituent, an alkyl group, or an alkenyl group, n1 and n2 represent an integer of 0 to 3, and X0 − represents an organic anion.

  一种正型抗蚀组合物，曝光后生成酸，其在碱性显影溶液中的溶解度在酸的作用下增加，该组合物包括一种基材组分，在酸的作用下在碱性显影溶液中的溶解度增加；以及由以下一般式（m0）表示的化合物：Z01至Z04分别独立表示具有电子吸引性的取代基，Rb21和Rb22分别独立表示烷基基团、可能具有取代基的脂环烃基团或羟基，Rb1表示可能具有取代基的芳基、烷基或烯基，n1和n2表示0至3的整数，X0−表示有机阴离子。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, AND COMPOUND
  申请人：FUJIFILM Corporation

  公开号：US20160280675A1

  公开（公告）日：2016-09-29

  The actinic ray-sensitive or radiation-sensitive resin composition includes a crosslinking agent having a polarity converting group and an alkali-soluble resin, in which the polarity converting group is a group capable of decomposing by the action of an alkaline aqueous solution to generate a carboxylic acid or sulfonic acid on the side having a crosslinking group.

  感光树脂或辐射敏感树脂组合物包括具有极性转换基团和可溶于碱性树脂的交联剂，其中极性转换基团是一种能够通过碱性水溶液作用分解并在具有交联基团的侧面生成羧酸或磺酸的基团。
• POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
  申请人：HIRANO Shuji

  公开号：US20080248419A1

  公开（公告）日：2008-10-09

  A positive resist composition, includes: (A) a resin that has a group having absorption at 248 nm at a main chain terminal of the resin (A), and a pattern forming method uses the composition.

  一种正性光刻胶组合物，包括：（A）一种具有在树脂（A）的主链端具有在248nm处吸收的基团的树脂，并且使用该组合物进行图案形成的方法。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION
  申请人：FUJIFILM CORPORATION

  公开号：US20150010855A1

  公开（公告）日：2015-01-08

  There is provided an actinic ray-sensitive or radiation-sensitive composition containing (α) a compound represented by the formula (αI) capable of generating an acid having a size of 200 Å 3 or more in volume and (β) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and the formula (αI) is defined as herein, and a resist film formed using the actinic ray-sensitive or radiation-sensitive composition, a resist-coated mask blanks coated with the resist film, a resist pattern forming method comprising exposing the resist film and developing the exposed film, a photomask obtained by exposing and developing the resist-coated mask blanks, a method for manufacturing an electronic device, comprising the resist pattern forming method and an electronic device manufactured by the manufacturing method of an electronic device.

  提供一种感光或辐射敏感的组合物，其中包含(α)一种化合物，其由公式(αI)表示，能够产生大小为200Å3或更大的体积的酸，以及(β)一种化合物，能够在受到光辐射或辐射时产生酸，公式(αI)的定义如本文所述。还提供了使用该感光或辐射敏感组合物形成的光阻膜，涂有光阻膜的光阻涂层掩模坯料，包括曝光光阻膜和显影曝光后膜的光阻图案形成方法，通过曝光和显影涂有光阻涂层的掩模坯料获得的光掩模，以及一种电子器件的制造方法，包括光阻图案形成方法和制造电子器件的电子器件制造方法，以及通过该电子器件制造方法制造的电子器件。
• REFRIGERATOR OIL COMPOSITION
  申请人：IDEMITSU KOSAN COMPANY LIMITED

  公开号：EP0785247A1

  公开（公告）日：1997-07-23

  There is disclosed a refrigerating machine oil composition which comprises, in the form of a blend, a base oil comprising a mineral oil or a synthetic oil and at least one species selected from the group consisting of a metallic salt of an inorganic phosphoric acid, e.g. potassium phosphate, an amine salt of an inorganic phosphoric acid, e.g. octylamine phosphate, a metallic salt of an organic phosphoric acid, e.g. dipotassium lauryl phosphate, an amine salt of an organic phosphoric acid, e.g. monooctylamine dioleyl phosphate, a metallic salt of an organic phosphonic acid, e.g. dipotassium oleyl phosphonate, an amine salt of an organic phosphonic acid, e.g. octylamine dilauryl phosphonate, a metallic salt of an organic phosphorous acid, e.g. sodium dioleyl phoshite, and an amine salt of an organic phosphorous acid, e.g. octylamene dioleyl phosphite. The refrigerating machine oil composition according to the present invention has excellent lubricating performance, enhances lubricity between an aluminum material and steel material, can suppress seizure and wear therebetween, does not bring about environmental pollution and thus is well suited as the lubricating oil for a refrigerating machine using, as the refrigerant, a hydrogen-containing Flon compound such as R134a.

  本发明公开了一种冷冻机油组合物，它以混合物的形式包括矿物油或合成油基础油和至少一种选自以下组别的物质：无机磷酸的金属盐，如磷酸二氢钾；无机磷酸的胺盐，如辛基胺磷酸酯；有机磷酸的金属盐，如十二烷基磷酸氢钾；有机磷酸的胺盐，如二十二烷基磷酸单辛胺；有机膦酸的金属盐，如二辛基膦酸；有机膦酸的胺盐，如二十二烷基膦酸；有机膦酸的金属盐，如二辛基膦酸；有机膦酸的胺盐，如二十二烷基膦酸。有机磷酸的金属盐，如十二烷基磷酸氢钾；有机磷酸的胺盐，如二油酸单辛胺磷酸酯；有机膦 酸的金属盐，如油酰基膦酸二钾；有机膦酸的胺盐，如辛基胺二月桂酰基磷酸酯；有机膦酸的金属盐，如辛基胺二月桂酰基磷酸酯；有机膦酸的胺盐，如辛基胺二月桂酰基磷酸酯。有机膦酸的金属盐，例如亚磷酸二烯丙酯钠；有机膦酸的胺盐，例如亚磷酸辛基二烯丙酯。 本发明的冷冻机油组合物具有优异的润滑性能，可增强铝材料和钢材料之间的润滑性，可抑制铝材料和钢材料之间的咬合和磨损，不会造成环境污染，因此非常适合用作使用含氢氟龙化合物（如 R134a）作为制冷剂的冷冻机的润滑油。

表征谱图