1,4-diaminobenzene tetraglycidylamine | 28469-72-9

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: 1,4-diaminobenzene tetraglycidylamine
• 英文别名: N~1~,N~1~,N~4~,N~4~-Tetrakis[(oxiran-2-yl)methyl]benzene-1,4-diamine；1-N,1-N,4-N,4-N-tetrakis(oxiran-2-ylmethyl)benzene-1,4-diamine
• CAS: 28469-72-9
• 化学式: C₁₈H₂₄N₂O₄
• 分子量: 332.4
• InChiKey: XUUZTOCNBZMTDJ-UHFFFAOYSA-N

物化性质

• 沸点：
  533.0±20.0 °C(Predicted)
• 密度：
  1.347±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  0.9
• 重原子数：
  24
• 可旋转键数：
  10
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  56.6
• 氢给体数：
  0
• 氢受体数：
  6

反应信息

• 作为产物：
  描述：

  tetrakis-N-(3-chloro-2-hydroxy-propyl)-p-phenylenediamine 在 sodium hydroxide 作用下， 以 水 为溶剂， 以89.2%的产率得到1,4-diaminobenzene tetraglycidylamine
  参考文献：
  名称：

  一种1,4-二氨基苯四缩水甘油胺的合成方法

  摘要：

  本发明公开了一种1,4‑二氨基苯四缩水甘油胺的合成方法，属于缩水甘油胺型环氧树脂合成领域。合成方法包括以下步骤：S1.将对苯二胺与溶剂混合，加入催化剂，升温至65‑75℃，再加入环氧氯丙烷，待对苯二胺反应完全后，停止反应，得到反应产物；S2.对S1所得反应产物降温至50‑55℃，再加入氢氧化钠水溶液，待S1所得反应产物反应完全后，停止反应，然后抽滤，再用甲苯萃取，取上层溶液，干燥，再次抽滤，最后在45‑55℃旋蒸，即得。本发明所制得产品在耐高温粘合剂、耐高温涂料、耐高温先进复合材料等领域有着广泛的应用。

  公开号：

  CN111548326A

文献信息

• NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20190169211A1

  公开（公告）日：2019-06-06

  The present invention has been made in view of the circumstances herein. An object of the present invention is to provide: a tetracarboxylic dianhydride which can lead to a polyimide usable as a base resin of a photosensitive resin composition capable of forming a fine pattern and obtaining high resolution without impairing excellent characteristics such as mechanical strength and adhesiveness; a polyimide resin obtained by using the tetracarboxylic dianhydride; and a method for producing the polyimide resin. The tetracarboxylic dianhydride is shown by the following general formula (1).

  本发明是基于本文中的情况而作出的。本发明的目的是提供：一种四羧酸二酐，可导致聚酰亚胺，作为感光树脂组合物的基树脂，能够形成细微图案并获得高分辨率，同时不损害优异的特性，如机械强度和粘附性；通过使用该四羧酸二酐获得的聚酰亚胺树脂；以及生产该聚酰亚胺树脂的方法。该四羧酸二酐由以下通用式（1）所示。
• Positive photosensitive resin composition, photo-curable dry film and method for producing the same, patterning process, and laminate
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US10197914B2

  公开（公告）日：2019-02-05

  The present invention provides a positive photosensitive resin composition containing (A) a polymer compound containing a siloxane chain, the polymer compound having a repeating unit shown by the general formula (1) and a weight average molecular weight of 3,000 to 500,000, (B) a photosensitive material capable of generating an acid by light and increasing a dissolution rate in an aqueous alkaline solution, (C) a crosslinking agent, and (D) a solvent. There can be provided a positive photosensitive resin composition that can remedy the problem of delamination caused on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern having a forward tapered shape without generating a scum and a footing profile in the pattern bottom and on the substrate when a widely used 2.38% TMAH aqueous solution is used as the developer.

  本发明提供了一种含有（A）含有硅氧烷链的聚合物化合物的阳性感光树脂组合物，该聚合物化合物具有由通式（1）所示的重复单元和重量平均分子量为3,000至500,000，（B）能够通过光生成酸并增加在水性碱性溶液中的溶解速率的感光材料，（C）交联剂和（D）溶剂。可以提供一种阳性感光树脂组合物，可以解决在金属线路（如Cu和Al）、电极和基板上引起的剥离问题，特别是在SiN等基板上，可以在使用广泛的2.38％TMAH水溶液作为显影剂时，在图案底部和基板上形成具有前向锥形形状的细微图案，而不会产生污点和底部轮廓。
• TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURSOR AND METHOD FOR PRODUCING SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20180120702A1

  公开（公告）日：2018-05-03

  The present invention provides a tetracarboxylic acid diester compound represented by the following general formula (1), wherein, X 1 represents a tetravalent organic group, and R 1 represents a group represented by the following general formula (2), wherein, the dotted line represents a bonding, Y 1 represents an organic group with a valency of k+1, Rs represents a group containing at least one silicon atom, “k” represents 1, 2 or 3, and “n” represents 0 or 1. There can be provided a tetracarboxylic acid diester compound which can lead a polymer of a polyimide precursor capable of using a base resin of a negative photosensitive resin composition which is capable of forming a fine pattern and giving high resolution, a polymer of a polyimide precursor obtained by using the tetracarboxylic acid diester compound and a method for producing the same.

  本发明提供了一种四羧酸二酯化合物，其表示为以下通式（1）：其中，X1表示四价有机基团，R1表示以下通式（2）所表示的基团：其中，虚线表示键合，Y1表示具有k+1价的有机基团，Rs表示含有至少一个硅原子的基团，“k”表示1、2或3，“n”表示0或1。可以提供一种四羧酸二酯化合物，该化合物能够引导聚合物的形成，该聚合物是由使用负光敏树脂组合物的基树脂制成的，该组合物能够形成细微图案并具有高分辨率，使用四羧酸二酯化合物制得的聚酰亚胺前体聚合物以及其制备方法。
• Liquid Crystal Alignment Agent, Liquid Crystal Alignment Film Manufactured Using the Same, and Liquid Crystal Display Device Including the Liquid Crystal Alignment Film
  申请人：KWAK Tae-Hyoung

  公开号：US20130123438A1

  公开（公告）日：2013-05-16

  Disclosed is a liquid crystal alignment agent that includes a polymer including a polyamic acid including a repeating unit represented by the following Chemical Formula 1, polyimide including a repeating unit represented by the following Chemical Formula 2, or a combination thereof, wherein in Chemical Formulas 1 and 2, X 1 , X 2 , Y 1 and Y 2 are the same as defined in the detailed description.

  本发明涉及一种液晶取向剂，包括聚合物，该聚合物包括聚酰亚胺酸，该聚酰亚胺酸包括由以下化学式1表示的重复单元，聚酰亚胺，包括由以下化学式2表示的重复单元，或其组合物，在化学式1和2中，X1、X2、Y1和Y2与详细说明中定义的相同。
• SILICONE SKELETON-CONTAINING POLYMER COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, SUBSTRATE, AND SEMICONDUCTOR APPARATUS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160200877A1

  公开（公告）日：2016-07-14

  The present invention provides a silicone skeleton-containing polymer compound containing a repeating unit shown by the general formula (1). There can be provided a silicone skeleton-containing polymer compound suitable used as a base resin of a chemically amplified negative resist composition that can remedy the problem of delamination generated on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern without generating a scum and a footing profile in the pattern bottom and on the substrate.

  本发明提供了一种含有硅骨架的聚合物化合物，其含有由通式（1）所示的重复单元。可以提供一种适用于化学增强负型光阻组合物的基础树脂的含有硅骨架的聚合物化合物，可以解决在金属布线（如Cu和Al）、电极和基板（特别是在SiN基板上）上产生的剥离问题，并且可以在图案底部和基板上不产生污点和足底轮廓的情况下形成细小的图案。