申请人:Hoffman-La Roche Inc.
公开号:US07858653B2
公开(公告)日:2010-12-28
The present invention relates to compounds of formula I,
wherein
X is —CH2— or —NH—;
Y is —CH(lower alkoxy)-, —CH(lower alkyl)-, —O—, —S—, —S(O)—, —S(O)2— or —CH2—; and
Ar is phenyl or naphthyl, which rings are optionally substituted by one or two substituents selected from the group consisting of halogen, lower alkoxy, lower alkyl and lower alkyl substituted by halogen;
or a pharmaceutically-acceptable acid-addition salt thereof;
with the proviso that, when X is —NH—, Y is —CH(lower alkyl)- or —CH2—;
and the further proviso that the compound is not
2-phenethyl-1H-imidazole hydrochloride,
2-(3,4-dichloro-phenoxymethyl)-1H-imidazole hydrochloride,
2-(2-chloro-phenoxymethyl)-1H-imidazole hydrochloride,
2-(2,3-dichloro-phenoxymethyl)-1H-imidazole,
benzyl-(1H-imidazol-2-yl)-amine,
(4-chloro-benzyl)-(1H-imidazol-2-yl)-amine, or
(2-chloro-benzyl)-(1H-imidazol-2-yl)-amine.
The invention relates also to a pharmaceutically-acceptable acid-addition salt of such a compound, processes for making the compound, and a composition comprising such a compound.
本发明涉及公式I的化合物,其中X为—CH2—或—NH—;Y为—CH(较低烷氧基)-、—CH(较低烷基)-、—O—、—S—、—S(O)—、—S(O)2—或—CH2—;Ar为苯基或萘基,所述环可以选择地由卤素、较低烷氧基、较低烷基和由卤素取代的较低烷基中的一种或两种取代基取代;或其药学上可接受的酸加合物;假设当X为—NH—时,Y为—CH(较低烷基)-或—CH2—;并且进一步假设该化合物不是2-苯乙基-1H-咪唑盐酸盐、2-(3,4-二氯苯氧甲基)-1H-咪唑盐酸盐、2-(2-氯苯氧甲基)-1H-咪唑盐酸盐、2-(2,3-二氯苯氧甲基)-1H-咪唑、苄基-(1H-咪唑-2-基)-胺、(4-氯苄基)-(1H-咪唑-2-基)-胺或(2-氯苄基)-(1H-咪唑-2-基)-胺。本发明还涉及该化合物的药学上可接受的酸加合物、制备该化合物的方法以及含有该化合物的组合物。