ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE
申请人:FUJIFILM CORPORATION
公开号:US20150185612A1
公开(公告)日:2015-07-02
There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a repeating unit represented by the specific formula and a group capable of decomposing by an action of an acid to produce a polar group; and an ionic compound represented by the specific formula, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition.
提供一种光致射线敏感或辐射敏感的树脂组合物,包括:(A)具有特定公式表示的重复单元和能够通过酸作用分解产生极性基团的基团的树脂;以及具有特定公式表示的离子化合物,以及包括该光致射线敏感或辐射敏感的树脂组合物的抗蚀膜。