3,4,5-Trihydroxy-2-iodobenzaldehyde

• 分子结构分类: 有机化合物 - 苯类化合物 - 酚类
• 英文名称: 3,4,5-Trihydroxy-2-iodobenzaldehyde
• 英文别名: 3,4,5-trihydroxy-2-iodobenzaldehyde
• 化学式: C₇H₅IO₄
• 分子量: 280.02
• InChiKey: SBWSQMYLKVEXEP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1
• 重原子数：
  12
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  77.8
• 氢给体数：
  3
• 氢受体数：
  4

文献信息

• CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2743249A1

  公开（公告）日：2014-06-18

  The present invention provides a cyclic compound having a molecular weight of 500 to 5000 and represented by the following formula (1), a method for producing the cyclic compound, a composition containing the cyclic compound, and a method for forming a resist pattern using the composition: wherein at least one of R0 is a monovalent group containing an iodine atom.

  本发明提供了一种分子量在 500 至 5000 之间并由下式（1）表示的环状化合物、一种生产该环状化合物的方法、一种含有该环状化合物的组合物以及一种使用该组合物形成抗蚀剂图案的方法： 其中 R0 至少有一个是含有碘原子的单价基团。
• COMPOUND, RESIN, AND METHOD FOR PURIFYING SAME, UNDERLAYER FILM FORMATION MATERIAL FOR LITHOGRAPHY, UNDERLAYER FILM FORMING COMPOSITION, AND UNDERLAYER FILM, AND METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING CIRCUIT PATTERN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP3279179A1

  公开（公告）日：2018-02-07

  The present invention provides a compound represented by following formula (1), wherein R1 represents a 2n-valent group having 1 to 30 carbon atoms, each of R2 to R5 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a halogen atom, a thiol group or a hydroxyl group, provided that at least one selected from R1 to R5 represents a group including an iodine atom and at least one R4 and/or at least one R5 represent/represents one or more selected from the group consisting of a hydroxyl group and a thiol group, each of m2 and m3 independently represents an integer of 0 to 8, each of m4 and m5 independently represents an integer of 0 to 9, provided that m4 and m5 do not represent 0 at the same time, n represents an integer of 1 to 4, and each of p2 to p5 independently represents an integer of 0 to 2.

  本发明提供了由下式（1）代表的化合物、 其中 R1 代表具有 1 至 30 个碳原子的 2n 价基团，R2 至 R5 各自独立地代表具有 1 至 10 个碳原子的直链、支链或环状烷基、具有 6 至 10 个碳原子的芳基、具有 2 至 10 个碳原子的烯基、具有 1 至 30 个碳原子的烷氧基、卤素原子、硫醇基或羟基、m2和m3各自独立地代表0至8的整数，m4和m5各自独立地代表0至9的整数，但m4和m5不能同时代表0，n代表1至4的整数，p2至p5各自独立地代表0至2的整数。
• RADIATION-SENSITIVE COMPOSITION, AMORPHOUS FILM, AND RESIST PATTERN-FORMATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP3279730A1

  公开（公告）日：2018-02-07

  A radiation-sensitive composition comprising a resist base material (A), an optically active diazonaphthoquinone compound (B), and a solvent (C), wherein the content of the solvent (C) in the composition is 20 to 99% by mass, the content of components except for the solvent (C) is 1 to 80% by mass, and the resist base material (A) is a compound represented by the following formula (1): wherein R1 is a 2n-valent group of 1 to 30 carbon atoms; R2 to R5 are each independently an alkyl group of 1 to 10 carbon atoms, an aryl group of 6 to 10 carbon atoms, an alkenyl group of 2 to 10 carbon atoms, an alkoxy group of 1 to 30 carbon atoms, a halogen atom, a thiol group, or a hydroxyl group, wherein at least one of R4 and/or at least one of R5 is one or more kinds selected from a hydroxyl group and a thiol group; m2 and m3 are each independently an integer of 0 to 8; m4 and m5 are each independently an integer of 0 to 9, wherein m4 and m5 are not 0 at the same time; n is an integer of 1 to 4; and p2 to p5 are each independently an integer of 0 to 2.

  一种辐射敏感性组合物，由抗蚀剂基材（A）、光学活性重氮萘醌化合物（B）和溶剂（C）组成，其中溶剂（C）在组合物中的含量为 20% 至 99%（按质量计），除溶剂（C）以外的其他成分的含量为 1% 至 80%（按质量计），抗蚀剂基材（A）是由下式（1）表示的化合物： 其中 R1 是 1 至 30 个碳原子的 2n 价基团；R2 至 R5 各自独立地是 1 至 10 个碳原子的烷基、6 至 10 个碳原子的芳基、2 至 10 个碳原子的烯基、1 至 30 个碳原子的烷氧基、卤素原子、硫醇基团或羟基，其中 R4 和/或 R5 中的至少一个是选自羟基和硫醇基团的一种或多种；m2和m3各自独立地为0至8的整数；m4和m5各自独立地为0至9的整数，其中m4和m5不同时为0；n为1至4的整数；以及p2至p5各自独立地为0至2的整数。
• RESIST BASE MATERIAL, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP3279728A1

  公开（公告）日：2018-02-07

  The present invention provides a resist base material containing a compound having a specific structure and/or a resin derived from the compound as a monomer.

  本发明提供了一种抗蚀剂基材，其中含有一种具有特定结构的化合物和/或以该化合物为单体衍生的树脂。
• COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING AMORPHOUS FILM, MATERIAL FOR FORMING LITHOGRAPHIC UNDERLAYER FILM, COMPOSTION FOR FORMING LITHOGRAPHIC UNDERLAYER FILM, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP3348542A1

  公开（公告）日：2018-07-18

  The present invention employs a compound represented by the following formula (1) and/or a resin comprising the compound as a constituent: wherein R1 is a 2n-valent group of 1 to 60 carbon atoms or a single bond; R2 to R5 are each independently a linear, branched, or cyclic alkyl group of 1 to 10 carbon atoms, an aryl group of 6 to 10 carbon atoms, an alkenyl group of 2 to 10 carbon atoms, an alkoxy group of 1 to 30 carbon atoms, a halogen atom, a thiol group, a hydroxy group, or a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group, provided that at least one selected from R2 to R5 is a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group; m2 and m3 are each independently an integer of 0 to 8; m4 and m5 are each independently an integer of 0 to 9, provided that m2, m3, m4, and m5 are not 0 at the same time; n is an integer of 1 to 4; and p2 to p5 are each independently an integer of 0 to 2.

  本发明采用了下式（1）所代表的化合物和/或以该化合物为成分的树脂： 其中 R1 是 1 至 60 个碳原子的 2n 价基团或单键；R2 至 R5 各自独立地为 1 至 10 个碳原子的直链、支链或环状烷基、6 至 10 个碳原子的芳基、2 至 10 个碳原子的烯基、1 至 30 个碳原子的烷氧基、卤素原子、硫醇基、羟基或羟基的氢原子被酸离解基团取代的基团，条件是从 R2 至 R5 中至少选取一个为羟基的氢原子被酸离解基团取代的基团；m2和m3各自独立地为0至8的整数；m4和m5各自独立地为0至9的整数，条件是m2、m3、m4和m5不同时为0；n为1至4的整数；以及p2至p5各自独立地为0至2的整数。