Sodium;1-(dimethylamino)butan-2-olate

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: Sodium;1-(dimethylamino)butan-2-olate
• 英文别名: sodium;1-(dimethylamino)butan-2-olate
• 化学式: C6H14NNaO
• 分子量: 139.17
• InChiKey: IFNFEIRUFZUURI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -3.31
• 重原子数：
  9
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• Alkoxide compound and raw material for forming thin film
  申请人：Wada Senji

  公开号：US10118940B2

  公开（公告）日：2018-11-06

  An alkoxide compound represented by the following formula (I), and a raw material for thin film formation containing the alkoxide compound. In the formula, R1 represents a linear or branched alkyl group having 2 to 4 carbon atoms, and R2 and R3 each represent a linear or branched alkyl group having 1 to 4 carbon atoms. In the formula (I), R1 is preferably an ethyl group. It is also preferred that one or both of R2 and R3 be an ethyl group. The raw material for thin film formation including an alkoxide compound represented by general formula (I) is preferably used as a raw material for chemical vapor deposition.

  一种由下式（I）表示的烷氧基化合物，以及一种含有该烷氧基化合物的薄膜形成原料。式中，R1 代表具有 2 至 4 个碳原子的直链或支链烷基，R2 和 R3 分别代表具有 1 至 4 个碳原子的直链或支链烷基。在式 (I) 中，R1 最好是乙基。R2 和 R3 中的一个或两个最好也是乙基。包括通式 (I) 所代表的氧化烷化合物的薄膜形成原料最好用作化学气相沉积的原料。
• ALKOXIDE COMPOUND AND RAW MATERIAL FOR FORMING THIN FILM
  申请人：ADEKA CORPORATION

  公开号：US20140174323A1

  公开（公告）日：2014-06-26

  An alkoxide compound represented by the following formula (I), and a raw material for thin film formation containing the alkoxide compound. In the formula, R 1 represents a linear or branched alkyl group having 2 to 4 carbon atoms, and R 2 and R 3 each represent a linear or branched alkyl group having 1 to 4 carbon atoms. In the formula (I), R 1 is preferably an ethyl group. It is also preferred that one or both of R 2 and R 3 be an ethyl group. The raw material for thin film formation including an alkoxide compound represented by general formula (I) is preferably used as a raw material for chemical vapor deposition.