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2-{[(4-chlorophenyl)sulfonyl]oxy}-1H-benzo[de]isoquinoline-1,3(2H)-dione

中文名称
——
中文别名
——
英文名称
2-{[(4-chlorophenyl)sulfonyl]oxy}-1H-benzo[de]isoquinoline-1,3(2H)-dione
英文别名
(1,3-dioxobenzo[de]isoquinolin-2-yl) 4-chlorobenzenesulfonate
2-{[(4-chlorophenyl)sulfonyl]oxy}-1H-benzo[de]isoquinoline-1,3(2H)-dione化学式
CAS
——
化学式
C18H10ClNO5S
mdl
——
分子量
387.8
InChiKey
KPAPATKFRWZKDF-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    4
  • 重原子数:
    26
  • 可旋转键数:
    3
  • 环数:
    4.0
  • sp3杂化的碳原子比例:
    0.0
  • 拓扑面积:
    89.1
  • 氢给体数:
    0
  • 氢受体数:
    5

文献信息

  • US4425424A
    申请人:——
    公开号:US4425424A
    公开(公告)日:1984-01-10
  • US5141842A
    申请人:——
    公开号:US5141842A
    公开(公告)日:1992-08-25
  • [EN] USE OF CINNAMIC ACID GROUPS CONTAINING ACETAL POLYMERS FOR RADIATION-SENSITIVE COMPOSITIONS AND LITHOGRAPHIC PRINTING PLATES<br/>[FR] UTILISATION DE GROUPES D'ACIDE CINNAMIQUE CONTENANT DES POLYMERES D'ACETAL DESTINES A DES COMPOSITION RADIOSENSIBLES ET A DES PLAQUES D'IMPRESSION LITHOGRAPHIQUE
    申请人:KODAK POLYCHROME GRAPHICS CO
    公开号:WO2002096961A1
    公开(公告)日:2002-12-05
    Copolymers containing the units A, B, C, D and optionally E are used to prepare radiation sensitive compositions and lithographic printing plates. The copolymer contains about 25 to 55 mol% of unit A which has the formula (A). The copolymer contains about 0.5 to 25 mol% of unit B which has the formula (B) wherein R1 is selected from the group consisting of alkyl, aryl and aralkyl. The copolymer contains about 0.5 to 40 mol% of unit C which has the formula (C) wherein X is an aliphatic or aromatic spacer group, and Ac is an acidic group selected from the group consisting of -COOH, -SO¿3?H, -SO2NR?9R10 with R9 and R10¿ independently being selected from hydrogen and alkyl; and when X is phenylene, Ac can also be OH. The copolymer contains about 20 to 70 mol% of unit D which has the formula (D) wherein Ci is selected from the group consisting of Ci-1, Ci-2, Ci-3 and Ci-4 which are represented by the following formulae (Ci-1, Ci-2, Ci-3 and Ci-4) wherein: k, m and n are integers independently selected from 0 to 5, R?3, R4 and R7¿ are independently selected from the group consisting of alkyl, alkoxy, -COOR?8, -NR9R10¿, -NH-CO-CH¿3?, halogen, and cyano, R?8¿ is selected from hydrogen and alkyl, R?9 and R10¿ are independently selected from hydrogen and alkyl, R5 is selected from the group consisting of hydrogen, alkyl, aryl and aralkyl, R6 is selected from the group consisting of alkyl, aryl and aralkyl and Y is selected from the group consisting of alkylene, arylene and arylenealkylene. The copolymer contains about 0 to 50 mol% of unit E which has the formula (E) wherein R2 is selected from the group consisting if alkyl, aryl and aralkyl groups.
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