Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation
申请人:Central Glass Company, Limited
公开号:US20140221589A1
公开(公告)日:2014-08-07
Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R
1
represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R
2
and R
3
each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.