2-Methyl-1-naphtalinthiol | 6383-54-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 2-Methyl-1-naphtalinthiol
• 英文别名: 2-Methyl-1-mercapto-naphthalin；2-Methylnaphthalene-1-thiol
• CAS: 6383-54-6
• 化学式: C₁₁H₁₀S
• 分子量: 174.266
• InChiKey: SPHFCVIKFFAFLR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.7
• 重原子数：
  12
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.09
• 拓扑面积：
  1
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  氧化异佛尔酮 、 2-Methyl-1-naphtalinthiol 在 氢氧化钾 作用下， 以 四氢呋喃 、 乙醇 为溶剂， 生成 2-(2-Methyl-1-naphthylthio)-3,5,5-trimethyl-2-cyclohexen-1-on
  参考文献：
  名称：

  Heteroatom directed photoarylation. Synthetic potential of the heteroatom sulfur

  摘要：

  DOI：

  10.1021/ja00475a027
• 作为产物：
  描述：

  1-溴-2-甲基萘 生成 2-Methyl-1-naphtalinthiol
  参考文献：
  名称：

  Heteroatom directed photoarylation. Synthetic potential of the heteroatom sulfur

  摘要：

  DOI：

  10.1021/ja00475a027

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20160145231A1

  公开（公告）日：2016-05-26

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。
• Sulfhydryl-Directed Iridium-Catalyzed C–H/Diazo Coupling and Tandem Annulation of Naphthalene-1-thiols
  作者：Kelu Yan、Yong Kong、Bin Li、Baiquan Wang

  DOI：10.1021/acs.orglett.9b02581

  日期：2019.9.6

  The first sulfhydryl-directed iridium-catalyzed C-H/diazo coupling and tandem annulation of naphthalene-1-thiols has been developed. The framework of naphtho[1,8-bc]thiopyrans was constructed in a one-step reaction with good yields. This transformation provides a practical synthetic route for the widely used naphtho[1,8-bc]thiopyran derivatives.

  已经开发了第一巯基定向的铱催化的CH /重氮偶合和萘-1-硫醇的串联环化反应。萘并[1,8-bc]硫代吡喃的构架是一步反应构建的，产率很高。该转化为广泛使用的萘并[1,8-bc]硫代吡喃衍生物提供了实用的合成途径。
• Metal Thietane Compound, Polymerizable Composition Containing the Compound, Resin and Use of the Resin
  申请人：Murakami Masakazu

  公开号：US20130018169A1

  公开（公告）日：2013-01-17

  Polymerizable compositions containing at least one metal thietane compound represented by general formulas (110), (201) or (120), respectively, wherein said formulas are as follows: and wherein the identified moieties and n, p, q and r are defined.

  含有至少一种由通式（110）、（201）或（120）表示的金属噻吩化合物的聚合物组合物，其中所述的通式如下：其中所识别的基团和n、p、q和r已被定义。
• METHOD FOR PRODUCING ALPHA-OLEFIN
  申请人：IDEMITSU KOSAN CO., LTD.

  公开号：US20140364669A1

  公开（公告）日：2014-12-11

  Provided is a production process for α-olefin which does not comply the Shultz-Flory distribution and which is excellent in the yields of α-olefins of 1-hexene up to 1-tetradecene each having 6 to 14 carbon atoms, particularly a yield of 1-octene. The above production process is characterized by polymerizing ethylene using (A) a specific chromium compound, (B) a specific aminophosphine ligand compound and (C) a promoter.

  提供了一种α-烯烃的生产工艺，该工艺不符合舒尔茨-弗洛里分布，在1-己烯至1-十四烯的α-烯烃收率方面表现出色，每种烯烃均含有6至14个碳原子，特别是1-辛烯的产率。上述生产工艺的特点是利用（A）特定的铬化合物，（B）特定的氨基膦配体化合物和（C）促进剂聚合乙烯。
• COMPOUND, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PATTERN FORMING METHOD
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：US20150376202A1

  公开（公告）日：2015-12-31

  The material for forming an underlayer film for lithography of the present invention contains a compound having a structure represented by the following general formula (1). (in formula (1), each X independently represents an oxygen atom or a sulfur atom, R 1 represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom or an aromatic group having 6 to 30 carbon atoms, R 2 represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, m is an integer of 0 to 3, n is an integer of 1 to 4, p is 0 or 1, and q is an integer of 1 to 100.)

  本发明的光刻下层膜材料包含具有以下一般式（1）所代表结构的化合物。（在式（1）中，每个X独立地代表氧原子或硫原子，R1代表一个单键或具有1至30个碳原子的2n-价碳氢基团，碳氢基团可能具有一个环状碳氢基团，一个双键，一个杂原子或具有6至30个碳原子的芳香族基团，R2代表具有1至10个碳原子的直链、支链或环状烷基基团，具有6至10个碳原子的芳基基团，具有2至10个碳原子的烯基基团，或一个羟基，m是0到3的整数，n是1到4的整数，p是0或1，q是1到100的整数。）