4-[2-(4-Butan-2-ylphenoxy)ethoxy]-2,3,5,6-tetrakis(methoxymethyl)phenol

• 分子结构分类: 有机化合物 - 苯类化合物 - 酚类
• 英文名称: 4-[2-(4-Butan-2-ylphenoxy)ethoxy]-2,3,5,6-tetrakis(methoxymethyl)phenol
• 英文别名: 4-[2-(4-butan-2-ylphenoxy)ethoxy]-2,3,5,6-tetrakis(methoxymethyl)phenol
• 化学式: C₂₆H₃₈O₇
• 分子量: 462.6
• InChiKey: YABFBHOCHXMLBD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  33
• 可旋转键数：
  15
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.54
• 拓扑面积：
  75.6
• 氢给体数：
  1
• 氢受体数：
  7

文献信息

• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, MASK BLANK AND METHOD OF FORMING PATTERN
  申请人：FUJIFILM Corporation

  公开号：US20140242502A1

  公开（公告）日：2014-08-28

  According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that contains a structure (P) containing at least one phenolic hydroxyl group and a structure (Q) containing at least one phenolic hydroxyl group whose hydrogen atom is replaced by a group (S) with a cyclic structure containing an acid crosslinking group, characterized in that the group (S) with a cyclic structure containing an acid crosslinking group is a group with a polycyclic structure or a group with a cyclic structure containing a hydroxymethyl group and/or an alkoxymethyl group.
• US9400430B2
  申请人：——

  公开号：US9400430B2

  公开（公告）日：2016-07-26