The present invention is a self-organization composition for pattern formation comprising a block copolymer [A] containing a polystyrene block having styrene units and a polyalkyl(meth)acrylate block having alkyl(meth)acrylate units, the self-organization composition for pattern formation being characterized in that the block copolymer [A] has groups (α) that are bonded to at least one terminus of the main chain and that contain hetero atoms. The hetero atoms are preferably at least one type selected from a group of oxygen, nitrogen, sulfur, phosphorus, tin, and silicon atoms.
本发明是一种用于图案形成的自组织组合物,该组合物包含嵌段共聚物[A],嵌段共聚物[A]含有具有
苯乙烯单元的聚
苯乙烯嵌段和具有烷基(甲基)
丙烯酸酯单元的聚烷基(甲基)
丙烯酸酯嵌段,该用于图案形成的自组织组合物的特征在于嵌段共聚物[A]具有与主链的至少一个末端键合且含有杂原子的基团(α)。杂原子最好至少有一种选自氧、氮、
硫、
磷、
锡和
硅原子。