4,8-Dihydroxy-1-methylnaphthalin | 860252-20-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 4,8-Dihydroxy-1-methylnaphthalin
• 英文别名: 4-methyl-naphthalene-1,5-diol；4-Methyl-naphthalin-1,5-diol；4-Methylnaphthalene-1,5-diol；4-methylnaphthalene-1,5-diol
• CAS: 860252-20-6
• 化学式: C₁₁H₁₀O₂
• 分子量: 174.199
• InChiKey: DIXOMIOAEOIZJP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.8
• 重原子数：
  13
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.09
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  1,5-二甲氧基萘 在 吡啶盐酸盐 、 一水合肼 、 甲苯 、 三氯氧磷 、 二乙二醇 作用下， 反应 2.0h， 生成 4,8-Dihydroxy-1-methylnaphthalin
  参考文献：
  名称：

  COMPOUNDS WITH POTENTIAL ACTIVITY AGAINST LETHAL RADIATIONS. V.¹ METHYL HOMOLOGS OF 1,5-DIHYDROXYNAPHTHALENE

  摘要：

  DOI：

  10.1021/jo01126a007

文献信息

• [EN] SENSOR DYES FOR REAL-TIME SENSING OF METAL IONS IN AQUEOUS ENVIRONMENTS<br/>[FR] COLORANTS DE DÉTECTION POUR LA DÉTECTION EN TEMPS RÉEL D'IONS MÉTALLIQUES DANS DES ENVIRONNEMENTS AQUEUX
  申请人：UWM RES FOUND INC

  公开号：WO2017066672A1

  公开（公告）日：2017-04-20

  Provided herein are dyes for detecting and distinguishing metals in a sample, as well as compositions and methods comprising the same.

  本文提供了用于检测和区分样品中金属的染料，以及包含相同染料的组合物和方法。
• COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP3508918A1

  公开（公告）日：2019-07-10

  The invention provides: a composition for forming an organic film, the composition having high filterability and enabling formation of an organic film which has high pattern-curving resistance, and which prevents a high-aspect line pattern particularly finer than 40 nm from line collapse and twisting after dry etching; a method for forming an organic film and a patterning process which use the composition; and a substrate for manufacturing a semiconductor device, including the organic film formed on the substrate. The composition for forming an organic film includes a condensate (A), which is a condensation product of dihydroxynaphthalene shown by the following formula (1) and a condensation agent, or a derivative of the condensate (A). A sulfur content among constituent elements contained in the condensate (A) or the derivative of the condensate (A) is 100 ppm or less in terms of mass.

  本发明提供了：一种用于形成有机薄膜的组合物，该组合物具有高过滤性，能够形成具有高图案抗弯曲性的有机薄膜，并且在干法蚀刻后能够防止特别细于40纳米的高光谱线图案发生线崩溃和扭曲；一种使用该组合物的形成有机薄膜的方法和图案化工艺；以及一种用于制造半导体器件的基板，包括在该基板上形成的有机薄膜。用于形成有机薄膜的组合物包括缩合物（A），它是下式（1）所示的二羟基萘和缩合剂的缩合产物，或缩合物（A）的衍生物。冷凝液（A）或冷凝液（A）的衍生物所含成分元素中的硫含量按质量计算不超过 100 ppm。
• Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US10007183B2

  公开（公告）日：2018-06-26

  The invention provides a compound for forming an organic film having a partial structure represented by the following formula (ii), wherein the ring structures Ar1, Ar2 and Ar3 each represent a substituted or unsubstituted benzene ring or naphthalene ring; e is 0 or 1; R0 represents a hydrogen atom or a linear, branched or cyclic monovalent organic group having 1 to 30 carbon atoms; L0 represents a linear, branched or cyclic divalent organic group having 1 to 32 carbon atoms; and the methylene group constituting L0 may be substituted by an oxygen atom or a carbonyl group. There can be provided an organic film composition for forming an organic film having high dry etching resistance as well as advanced filling/planarizing characteristics.

  本发明提供了一种用于形成有机薄膜的化合物，其部分结构由下式(ii)表示、 其中，环结构 Ar1、Ar2 和 Ar3 分别代表取代或未取代的苯环或萘环；e 为 0 或 1；R0 代表氢原子或具有 1 至 30 个碳原子的线性、支链或环状一价有机基团；L0 代表具有 1 至 32 个碳原子的线性、支链或环状二价有机基团；构成 L0 的亚甲基可被氧原子或羰基取代。本发明可提供一种有机薄膜组合物，用于形成具有高抗干蚀刻性和高级填充/平面化特性的有机薄膜。
• Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US11018015B2

  公开（公告）日：2021-05-25

  The invention provides: a composition for forming an organic film, the composition having high filterability and enabling formation of an organic film which has high pattern-curving resistance, and which prevents a high-aspect line pattern particularly finer than 40 nm from line collapse and twisting after dry etching; a method for forming an organic film and a patterning process which use the composition; and a substrate for manufacturing a semiconductor device, including the organic film formed on the substrate. The composition for forming an organic film includes a condensate (A), which is a condensation product of dihydroxynaphthalene shown by the following formula (1) and a condensation agent, or a derivative of the condensate (A). A sulfur content among constituent elements contained in the condensate (A) or the derivative of the condensate (A) is 100 ppm or less in terms of mass.

  本发明提供了：一种用于形成有机薄膜的组合物，该组合物具有高过滤性，能够形成具有高图案抗弯曲性的有机薄膜，并且在干法蚀刻后能够防止特别细于40纳米的高光谱线图案发生线崩溃和扭曲；一种使用该组合物的形成有机薄膜的方法和图案化工艺；以及一种用于制造半导体器件的基板，包括在该基板上形成的有机薄膜。用于形成有机薄膜的组合物包括缩合物（A），它是下式（1）所示的二羟基萘和缩合剂的缩合产物，或缩合物（A）的衍生物。冷凝液（A）或冷凝液（A）的衍生物所含成分元素中的硫含量按质量计算不超过 100 ppm。
• SENSOR DYES FOR REAL-TIME SENSING OF METAL IONS IN AQUEOUS ENVIRONMENTS
  申请人：The UWM Research Foundation, Inc

  公开号：EP3362518B1

  公开（公告）日：2022-04-27