3-N,3-N,4-N,4-N-tetramethylpyridine-3,4-diamine

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: 3-N,3-N,4-N,4-N-tetramethylpyridine-3,4-diamine
• 化学式: C₉H₁₅N₃
• 分子量: 165.24
• InChiKey: QCDXGNREXLHKSP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.1
• 重原子数：
  12
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.44
• 拓扑面积：
  19.4
• 氢给体数：
  0
• 氢受体数：
  3

文献信息

• CONDUCTIVE COMPOSITION, ANTISTATIC FILM, LAMINATE AND PRODUCTION THEREFOR, AND PRODUCTION METHOD FOR PHOTOMASK
  申请人：Mitsubishi Rayon Co., Ltd.

  公开号：EP3144351A1

  公开（公告）日：2017-03-22

  This conductive composition includes: a conductive polymer (a) having a sulfonic acid group and/or a carboxy group; a basic compound (b) having at least one nitrogen-containing heterocyclic ring and an amino group; an aqueous polymer (c) having a hydroxyl group (excluding the conductive polymer (a)); a hydrophilic organic solvent (d); and water (e).

  这种导电组合物包括：具有磺酸基和/或羧基的导电聚合物 (a)；具有至少一个含氮杂环和一个氨基的碱性化合物 (b)；具有羟基的水性聚合物 (c)（不包括导电聚合物 (a)）；亲水性有机溶剂 (d)；以及水 (e)。
• ELECTROCONDUCTIVE COMPOSITION AND PRODUCTION METHOD THEREFOR, AND WATER-SOLUBLE POLYMER AND PRODUCTION METHOD THEREFOR
  申请人：Mitsubishi Chemical Corporation

  公开号：EP3744794A1

  公开（公告）日：2020-12-02

  A conductive composition comprising a conductive polymer (A), a water-soluble polymer (B), and a solvent (C1), wherein: the water-soluble polymer (B) comprises a water-soluble polymer (B11) represented by formula (11), and an amount of a water-soluble polymer (B2) represented by formula (2) as the water-soluble polymer (B) is 0.15 % by mass or less, based on a total mass of the conductive composition: wherein R1 denotes a linear or branched alkyl group with 6 to 20 carbon atoms, each of R4 and R5 independently denotes a methyl or ethyl group, R6 denotes a hydrophilic group, R7 denotes a hydrogen atom or a methyl group, Y1 denotes a single bond, -S-, -S(=O)-, -C(=O)-O- or -O-, Z denotes a cyano group or a hydroxy group, each of p1 and q denotes an average number of repetitions, and is a number of from 1 to 50, and m denotes a number of from 1 to 5.

  一种导电组合物，包括导电聚合物 (A)、水溶性聚合物 (B) 和溶剂 (C1)，其中：水溶性聚合物 (B) 包括由式 (11) 表示的水溶性聚合物 (B11)，以及作为水溶性聚合物 (B) 的由式 (2) 表示的水溶性聚合物 (B2) 的量，以导电组合物的总质量为基准，按质量计为 0.15 % 或更少： 其中 R1 表示具有 6 至 20 个碳原子的直链或支链烷基，R4 和 R5 各自独立地表示甲基或乙基，R6 表示亲水基团，R7 表示氢原子或甲基、Y1 表示单键、-S-、-S(＝O)-、-C(＝O)-O-或-O-，Z 表示氰基或羟基，p1 和 q 中的每一个表示平均重复次数，并且是 1 至 50 的数字，m 表示 1 至 5 的数字。
• CONDUCTIVE FILM, METHOD FOR PRODUCING SAME, CONDUCTOR, RESIST PATTERN FORMATION METHOD, AND LAMINATE
  申请人：Mitsubishi Chemical Corporation

  公开号：EP3767639A1

  公开（公告）日：2021-01-20

  The conductive film of the present invention includes a conductive polymer (A) and has a film thickness of 35 nm or less, wherein: a surface resistance of the conductive film is 1 × 1011 Ω/sq. or less, and a standard deviation of current that flows through the conductive film upon application of voltage to the conductive film is 5 or less. The conductor of the present invention has a substrate, and the conductive film provided on at least a part of the surface of the substrate. The resist pattern forming method of the present invention includes a lamination step of forming the conductive film on a surface of a resist layer including a chemically amplified resist, said resist layer formed on one surface of a substrate, and an exposure step of irradiating the substrate with an electron beam according to a pattern on its side on which the conductive film is formed. The laminate of the present invention has a resist layer and an antistatic film formed on the surface of the resist layer, wherein the antistatic film is the above-mentioned conductive film.

  本发明的导电薄膜包括导电聚合物 (A)，薄膜厚度为 35 纳米或更小，其中：导电薄膜的表面电阻为 1 × 1011 Ω/sq. 或更小，在导电薄膜上施加电压时流过导电薄膜的电流标准偏差为 5 或更小。本发明的导体具有基板，导电膜至少设置在基板表面的一部分。本发明的抗蚀层图案形成方法包括在包括化学放大抗蚀层在内的抗蚀层表面上形成导电膜的层压步骤，所述抗蚀层形成在基板的一个表面上，以及根据导电膜形成的一面上的图案用电子束照射基板的曝光步骤。本发明的层压板具有抗蚀层和在抗蚀层表面形成的抗静电膜，其中抗静电膜为上述导电膜。
• ELECTRICALLY CONDUCTIVE COMPOSITION, ELECTRICALLY CONDUCTIVE FILM, AND LAMINATE
  申请人：Mitsubishi Chemical Corporation

  公开号：EP3780009A1

  公开（公告）日：2021-02-17

  The conductive composition of the present invention includes a conductive polymer (A) having an acidic group, and a basic compound (B) having a cyclic amide and an amino group in its molecule. The conductive film of the present invention is formed from the conductive composition. The laminate of the present invention includes a substrate; an electron beam resist layer, formed on at least one surface of the substrate; and a conductive film formed on the electron beam resist layer.

  本发明的导电组合物包括具有酸性基团的导电聚合物（A）和分子中含有环状酰胺和氨基的碱性化合物（B）。本发明的导电薄膜由导电组合物形成。本发明的层压板包括基板；在基板至少一个表面上形成的电子束抗蚀层；以及在电子束抗蚀层上形成的导电膜。
• CONDUCTIVE COMPOSITION AND METHOD FOR MANUFACTURING SAME, AND CONDUCTOR AND METHOD FOR MANUFACTURING SAME
  申请人：Mitsubishi Chemical Corporation

  公开号：EP3882314A1

  公开（公告）日：2021-09-22

  A conductive composition comprising a conductive polymer (A) having an acidic group, and a basic compound (B), wherein: an area ratio (X/Y) is 0.046 or less as calculated by an specific method, which is a ratio an area (X) of a region corresponding to molecular weight (M) ranging from 300 to 3300, relative to an area (Y) of an entire region ascribed to the conductive polymer (A); or a ratio, ZS/ZR, is 20 or less, wherein the ZS is a maximum value of fluorescence intensity in a wavelength region of 320 to 420 nm when a fluorescence spectrum is measured using a spectrofluorometer at an excitation wavelength of 230 nm with respect to a measurement solution obtained by diluting the conductive composition with water so as to adjust solids content of the conductive polymer (A) to 0.6 % by mass, and the ZR is a maximum value of Raman scattering intensity in a wavelength region of 380 to 420 nm when a fluorescence spectrum of water is measured using a spectrofluorometer at an excitation wavelength of 350 nm.

  一种导电组合物，包括具有酸性基团的导电聚合物(A)和碱性化合物(B)，其中：按特定方法计算的面积比(X/Y)为0.0.046 或更低，该值是分子量 (M) 在 300 至 3300 之间的区域的面积 (X) 与整个区域的面积 (Y) 之比，该区域的面积归因于导电聚合物 (A)；或比值 ZS/ZR 为 20 或更小，其中 ZS 是使用分光荧光仪在 230 纳米的激发波长下测量荧光光谱时，相对于通过用水稀释导电组合物以将导电聚合物 (A) 的固体含量调整至 0.6 % (质量百分比)，而 ZR 是在 350 nm 的激发波长下使用分光荧光仪测量水的荧光光谱时，拉曼散射强度在 380 至 420 nm 波长区域内的最大值。