申请人:Kim Deog-Bae
公开号:US20080070161A1
公开(公告)日:2008-03-20
The photoresist monomer including an oxime group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula.
In Formula, R* is independently a hydrogen or a methyl group, and R is a substituted or unsubstituted C
1
˜C
25
alkyl group with or without an ether group, or a substituted or unsubstituted C
4
˜C
25
hydrocarbon group including an aryl group, a heteroaryl group, a cycloalkyl group or a multicycloalkyl group with or without an ether group, a ketone group or a sulfur.