Dimethyl(tetradecan-2-yl)azanium;hydroxide

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: Dimethyl(tetradecan-2-yl)azanium;hydroxide
• 化学式: C16H37NO
• 分子量: 259.47
• InChiKey: CLFSONLBVDKIHC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.65
• 重原子数：
  18
• 可旋转键数：
  12
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  5.4
• 氢给体数：
  2
• 氢受体数：
  1

文献信息

• Coloured Particles for Electrophoretic Displays
  申请人：Fontana Margherita

  公开号：US20090296195A1

  公开（公告）日：2009-12-03

  The present invention discloses the use of functionalized particles as electrophoretic displaying particles, wherein the functionalized particles are SiO 2 , Al 2 O 3 or mixed SiO 2 and Al 2 O 3 particles comprising, covalently bound to an oxygen atom on the surface, a radical of formula (1), wherein R 1 and R 2 are independently of each other hydrogen, particle surface-O—, or a substituent, n is 1, 2, 3, 4, 5, 6, 7 or 8, B is the direct bond or a bridge member, and D is the residue of an organic chromophore.

  本发明揭示了功能化颗粒作为电泳显示颗粒的用途，其中功能化颗粒为SiO2、Al2O3或混合SiO2和Al2O3颗粒，其中这些颗粒通过共价键结合到表面上的氧原子，具有以下结构的自由基（1），其中R1和R2分别独立地为氢、颗粒表面-O-，或取代基，n为1、2、3、4、5、6、7或8，B为直接键或桥接成员，D为有机色团的残基。
• Photosensitive composition and method for forming pattern using the same
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：EP1612602A2

  公开（公告）日：2006-01-04

  A positive working photosensitive composition which is useful in the manufacturing step of a semiconductor such as IC, the manufacture of a circuit board such as liquid crystals and thermal heads, and other fabrication steps and has an excellent resolution and line edge roughness, and a method for forming a pattern using the same, are provided, which are a photosensitive composition containing (A) a resin having a repeating unit having a specific group, whose solubility in an alkaline developer increases by the action of an acid, and a method for forming a pattern using the same.

  本发明提供了一种可用于集成电路等半导体的制造步骤、液晶和热敏头等电路板的制造以及其他制造步骤，并具有出色的分辨率和线边粗糙度的正向工作光敏组合物，以及使用该组合物形成图案的方法，该组合物是一种光敏组合物，其中含有(A)具有特定基团的重复单元的树脂，其在碱性显影剂中的溶解度在酸的作用下会增加，以及使用该组合物形成图案的方法。
• Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
  申请人：FUJIFILM Corporation

  公开号：EP1621927B1

  公开（公告）日：2018-05-23
• COLOURED PARTICLES FOR ELECTROPHORETIC DISPLAYS
  申请人：Ciba Holding Inc.

  公开号：EP1948738A1

  公开（公告）日：2008-07-30
• POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSURE AND A METHOD OF FORMING THE PATTERN USING THE SAME
  申请人：FUJIFILM Corporation

  公开号：US20160187780A1

  公开（公告）日：2016-06-30

  A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.