1-(4-hydroxy-phenyl)-tetrahydro-thiopyranium | 51843-79-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 酚类
• 英文名称: 1-(4-hydroxy-phenyl)-tetrahydro-thiopyranium
• 英文别名: 4-(Thian-1-ium-1-yl)phenol
• CAS: 51843-79-9
• 化学式: C₁₁H₁₅OS
• 分子量: 195.305
• InChiKey: JBTBXXTYLSJCHQ-UHFFFAOYSA-O

计算性质

• 辛醇/水分配系数(LogP)：
  2.9
• 重原子数：
  13
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.45
• 拓扑面积：
  21.2
• 氢给体数：
  1
• 氢受体数：
  1

文献信息

• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US20140221673A1

  公开（公告）日：2014-08-07

  A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below (R 1 represents a sulfur atom or an oxygen atom; R 2 represents a single bond or a divalent linking group; and Y represents an aromatic hydrocarbon group or an aliphatic hydrocarbon group having a polycyclic group, provided that the aromatic hydrocarbon group or the aliphatic hydrocarbon may have a carbon atom or a hydrogen atom thereof substituted with a substituent.

  一种抗蚀组合物，包括基础组分（A），在酸的作用下在显影溶液中表现出改变的溶解性，以及在暴露后生成酸的酸发生器组分（B），基础组分（A）包含具有下述通用式（a5-0）所示的结构单元（a5）的聚合物化合物（A1）（R1代表硫原子或氧原子；R2代表单键或二价连接基团；Y代表芳香烃基团或具有多环基团的脂肪烃基团，前提是芳香烃基团或脂肪烃基团可以有其中的碳原子或氢原子被取代的取代基）。
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, AND ACID GENERATOR
  申请人：Kawaue Akiya

  公开号：US20090068591A1

  公开（公告）日：2009-03-12

  A compound represented by formula (I); and a compound represented by formula (b1-1): wherein X represents —O—, —S—, —O—R 3 — or —S—R 4 —, wherein each of R 3 and R 4 independently represents an alkylene group of 1 to 5 carbon atoms; R 2 represents an alkyl group of 1 to 6 carbon atoms, an alkoxy group of 1 to 6 carbon atoms, a halogenated alkyl group of 1 to 6 carbon atoms, a halogen atom, a hydroxyalkyl group of 1 to 6 carbon atoms, a hydroxyl group or a cyano group; a represents an integer of 0 to 2; Q 1 represents an alkylene group of 1 to 12 carbon atoms or a single bond; Y 1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group; M + represents an alkali metal ion; and A + represents an organic cation.

  化合物的化学式（I）代表的化合物；以及化学式（b1-1）代表的化合物：其中X代表—O—，—S—，—O—R3—或—S—R4—，其中R3和R4分别独立代表1至5个碳原子的烷基基团；R2代表1至6个碳原子的烷基基团，1至6个碳原子的烷氧基团，1至6个碳原子的卤代烷基团，卤原子，1至6个碳原子的羟基烷基团，羟基或氰基；a代表0至2的整数；Q1代表1至12个碳原子的烷基基团或单键；Y1代表1至4个碳原子的烷基基团或氟代烷基基团；M+代表碱金属离子；A+代表有机阳离子。
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR
  申请人：Seshimo Takehiro

  公开号：US20100121077A1

  公开（公告）日：2010-05-13

  A compound represented by general formula (I); and a compound represented by general formula (b1-1). wherein Q 1 represents a divalent linkage group or a single bond; Y 1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an —SO 2 — bond in the structure thereof; M − represents an alkali metal ion; and A + represents an organic cation.

  一个由通式(I)表示的化合物；和一个由通式(b1-1)表示的化合物。其中，Q1代表一个二价连接基团或一个单键；Y1代表一个可能带有取代基的烷基基团或一个可能带有取代基的氟代烷基基团；X代表一个含有取代基的3到30个碳原子的环状基团，并且在其结构中具有一个—SO2—键；M−代表一种碱金属离子；A+代表一个有机阳离子。
• NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
  申请人：Hada Hideo

  公开号：US20090162788A1

  公开（公告）日：2009-06-25

  A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: wherein R X represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q 2 and Q 3 independently represents a single bond or a divalent linkage group; Y 1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z + represents an organic cation exclusive of an ion represented by general formula (w-1).

  一种抗蚀组合物，包括基础组分（A），在酸作用下在碱性显影液中表现出改变的溶解度，以及酸发生组分（B），在暴露后产生酸，酸发生组分（B）包括一个由下式（b1-1）表示的化合物组成的酸发生剂（B1）：其中RX表示一个可具有除氮原子以外的取代基的碳氢基团；Q2和Q3各自独立地表示单键或双价连接基团；Y1表示1到4个碳原子的烷基或氟代烷基；Z+表示一种有机阳离子，不包括由通式（w-1）表示的离子。
• Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin
  申请人：Takeshita Masaru

  公开号：US20100143844A1

  公开（公告）日：2010-06-10

  A resist composition for immersion exposure including: a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid; an acid-generator component (B) which generates acid upon exposure; and a fluorine-containing resin component (F); dissolved in an organic solvent (S), the fluorine-containing resin component (F) including a structural unit (f1) containing a fluorine atom, a structural unit (f2) containing a hydrophilic group-containing aliphatic hydrocarbon group, and a structural unit (f3) derived from an acrylate ester containing a tertiary alkyl group-containing group or an alkoxyalkyl group.

  一种用于浸泡曝光的抗蚀组合物，包括：基础组分（A），在酸作用下在碱性显影液中表现出改变的溶解度；酸发生器组分（B），在曝光时生成酸；和含氟树脂组分（F）；溶解于有机溶剂（S）中，含氟树脂组分（F）包括一个含有氟原子的结构单元（f1），一个含有亲水基团的脂肪烃基团的结构单元（f2），以及来自丙烯酸酯的结构单元（f3），其中该丙烯酸酯含有三级烷基基团或烷氧基烷基团。