(2-Hydroxy-5-nitrophenyl)methyl-dimethylsulfanium

• 分子结构分类: 有机化合物 - 苯类化合物 - 酚类
• 英文名称: (2-Hydroxy-5-nitrophenyl)methyl-dimethylsulfanium
• 化学式: C9H12NO3S+
• 分子量: 214.26
• InChiKey: NDJYMLKYQOXZIA-UHFFFAOYSA-O

计算性质

• 辛醇/水分配系数(LogP)：
  1.9
• 重原子数：
  14
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  67
• 氢给体数：
  1
• 氢受体数：
  3

文献信息

• COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE
  申请人：LEE Wai Mun

  公开号：US20120083436A1

  公开（公告）日：2012-04-05

  The present invention is directed to compositions and method of use for treating semiconductor substrate comprising a sulfonium compound and a nucleophilic amine in the fabrication of electronic devices. Optionally, the said composition further comprises a chelating agent, and solvent. The pH of the said solution can be adjusted with the addition of acid or base. The semiconductor manufacturing processes include steps for post etch residue, photoresist removal and steps during chemical mechanical planarization and post chemical mechanical planarization.
• US8173584B2
  申请人：——

  公开号：US8173584B2

  公开（公告）日：2012-05-08
• US8101561B2
  申请人：——

  公开号：US8101561B2

  公开（公告）日：2012-01-24