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methyl-(1-methyl-1-[1]naphthyl-ethyl)-ether | 171117-17-2

中文名称
——
中文别名
——
英文名称
methyl-(1-methyl-1-[1]naphthyl-ethyl)-ether
英文别名
1-(α-Methoxy-isopropyl)-naphthalin;2-Methoxy-2-(naphthyl-(1))-propan;Methyl-(1-methyl-1-[1]naphthyl-aethyl)-aether;1-(1-Methoxy-1-methylethyl)naphthalene;1-(2-Methoxypropan-2-yl)naphthalene
methyl-(1-methyl-1-[1]naphthyl-ethyl)-ether化学式
CAS
171117-17-2
化学式
C14H16O
mdl
——
分子量
200.28
InChiKey
MRPVSELWLNGKSI-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.4
  • 重原子数:
    15
  • 可旋转键数:
    2
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.29
  • 拓扑面积:
    9.2
  • 氢给体数:
    0
  • 氢受体数:
    1

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

点击查看最新优质反应信息

文献信息

  • Conformational Studies by Dynamic NMR. 64.<sup>1</sup> Stereomutations of Atropisomers and of Conformational Enantiomers in Ethers of Hindered Naphthylcarbinols
    作者:Daniele Casarini、Lodovico Lunazzi、Andrea Mazzanti、Elisabetta Foresti
    DOI:10.1021/jo9804801
    日期:1998.7.1
    Methyl or ethyl ethers of 1-naphthyl carbinols ArCR2OR' (Ar = 1-naphthyl, R' = Me, Et) can occur in a range of rotational conformations whose population varies with the nature of the substituents R. The passage between such conformation minima is achieved by rotation, during which one group R or OR' passes either the 2- or the 8-position of the naphthalene, and depending on the nature of R and OR', some of these interconversions are slow on the NMR time scale. Dynamic NMR experiments, supported by molecular mechanics calculations, show that different minima are preferred as the R group changes. These conformations are identified, their populations are determined, and the barriers to their interconversions are measured. In particular when R is a tert-butyl group, two atropisomers (with the OMe moiety near the 2- or 8-position) could be physically separated and their structures determined by NOE experiments in solution and X-ray diffraction in the solid state. Each of these exists as a pair of stereolabile enantiomers, with a barrier of 9-10 kcal mol(-1) for interconversion.
  • RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS AND FULLERENE DERIVATIVE
    申请人:Watanabe Takeru
    公开号:US20110195362A1
    公开(公告)日:2011-08-11
    There is disclosed a resist underlayer film composition of a multilayer resist film used in lithography including (A) a fullerene derivative having a carboxyl group protected by a thermally labile group and (B) an organic solvent. There can be a resist underlayer film composition of a multilayer resist film used in lithography for forming a resist underlayer in which generation of wiggling in substrate etching can be highly suppressed and the poisoning problem in forming an upper layer pattern using a chemically amplified resist can be avoided, a process for forming the resist underlayer film, a patterning process and a fullerene derivative.
  • US5955509A
    申请人:——
    公开号:US5955509A
    公开(公告)日:1999-09-21
  • US8835092B2
    申请人:——
    公开号:US8835092B2
    公开(公告)日:2014-09-16
  • New Compounds. Oxime of Furfuralacetone
    作者:Richard Kleene
    DOI:10.1021/ja01857a077
    日期:1941.12
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