[EN] PIPERAZINE METABOTROPIC GLUTAMATE RECEPTOR 5 (MGLUR5) NEGATIVE ALLOSTERIC MODULATORS FOR ANXIETY/DEPRESSION<br/>[FR] PIPÉRAZINE UTILISÉE EN TANT QUE MODULATEURS ALLOSTÉRIQUES NÉGATIFS AGISSANT SUR LE RÉCEPTEUR MÉTABOTROPIQUE DU GLUTAMATE DE TYPE 5 (MGLUR5)
申请人:WYETH CORP
公开号:WO2009143404A1
公开(公告)日:2009-11-26
The present teachings relate to piperazine metabotropic glutamate receptor 5 (mGluR5) negative allosteric modulators having Formula (I); wherein the constituent variables are as defined herein. The present teachings further relate to methods for the preparation of the compounds, and to methods for using the compounds for treatment of diseases and disorders including schizophrenia, paranoia, depression, manic-depressive illness and anxiety.
A new series of benzene and isoquinoline sulfonamide derivatives were synthesized by nucleophilicdisplacement reaction on benzene and isoquinoline sulfonyl chlorides by substituted amines (primary and secondary). The title compounds were evaluated for antimalarial activity against Plasmodium falciparum in vitro and showed MIC in the range of 2-50 microg/mL.
Benzenesulfenamides as antihypertensive agents. Substituted piperidine and 1-arylpiperazine derivatives
作者:Sol S. Klioze、Richard C. Allen、Jeffrey C. Wilker、David L. Woodward
DOI:10.1021/jm00180a020
日期:1980.6
The synthesis and antihypertensiveactivity of several piperidinebenzenesulfenamides related to the previously reported potent hypotensiveagents 1 and a series of 1-arypiperazine-4-benzenesulfenamides 7 are described. A number of the latter compounds exhibit marked antihypertensive properties. The most interesting of these compounds, 7a and 7k, have been evaluated in several other animal models. In
Chemical mechanical planarization for tungsten-containing substrates
申请人:AIR PRODUCTS AND CHEMICALS, INC.
公开号:EP2779217A2
公开(公告)日:2014-09-17
Chemical mechanical polishing (CMP) compositions for polishing tungsten or tungsten-containing substrates comprise an abrasive, at least one solid catalyst, a chemical additive selected from the groups consisting of piperazine derivatives, salts of cyanate, and combinations thereof; and a liquid carrier. Systems and processes use the aqueous formulations for polishing tungsten or tungsten-containing substrates.