(propan-2-ylideneamino) N,N-dimethylcarbamate | 18304-47-7

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: (propan-2-ylideneamino) N,N-dimethylcarbamate
• CAS: 18304-47-7
• 化学式: C₆H₁₂N₂O₂
• 分子量: 144.17
• InChiKey: HDQKVYPUASGNJP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.3
• 重原子数：
  10
• 可旋转键数：
  2
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  41.9
• 氢给体数：
  0
• 氢受体数：
  3

文献信息

• CHEMICALLY AMPLIFIED RESIST MATERIAL, TOPCOAT FILM MATERIAL AND PATTERN FORMATION METHOD USING THE SAME
  申请人：ENDO Masayuki

  公开号：US20080286687A1

  公开（公告）日：2008-11-20

  A resist film made of a chemically amplified resist material including a polymer; a photo-acid generator and carbamoyl oxime is formed on a substrate. Subsequently, pattern exposure is performed by selectively irradiating the resist film with exposing light. After the pattern exposure, the resist film is baked, and the baked resist film is developed, so as to form a resist pattern made of the resist film.