1,5-bisdiethylaminopentane | 60832-68-0

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: 1,5-bisdiethylaminopentane
• 英文别名: tetra-N-ethyl-pentanediyldiamine；Tetra-N-aethyl-pentandiyldiamin；N,N,N',N'-tetraethylpentane-1,5-diamine
• CAS: 60832-68-0
• 化学式: C₁₃H₃₀N₂
• 分子量: 214.395
• InChiKey: OQIRZNNBUNOXTQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.8
• 重原子数：
  15
• 可旋转键数：
  10
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  6.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  tetra-N-ethyl-pent-2-ynediyldiamine 在 乙醇 、 镍 作用下， 生成 1,5-bisdiethylaminopentane
  参考文献：
  名称：

  Hypotensive Agents. I. Acetylenic Diamines

  摘要：

  DOI：

  10.1021/ja01550a049

文献信息

• Composition for resist patterning and method for forming pattern using same
  申请人：AZ Electronic Materials (Luxembourg) S.a.r.l.

  公开号：US10191380B2

  公开（公告）日：2019-01-29

  [Problem] To provide a composition capable of improving surface roughness of resist patterns, and also to provide a pattern formation method employing the composition. [Solution] The present invention provides a composition containing a particular nitrogen-containing compound, an anionic surfactant having a sulfo group, and water; and also provides a pattern formation method containing a step of applying the composition to a resist pattern beforehand developed and dried.

  问题 提供一种能够改善抗蚀剂图案表面粗糙度的组合物，并提供一种使用该组合物的图案形成方法。 [解决方案］ 本发明提供了一种含有特定含氮化合物、具有磺基的阴离子表面活性剂和水的组合物；还提供了一种图案形成方法，其中包含将该组合物用于事先显影和干燥的光刻胶图案的步骤。
• Composition for coating resist pattern
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US10558119B2

  公开（公告）日：2020-02-11

  The invention provides a composition for coating a resist pattern and reversing the pattern by utilizing a difference in etching rates. A composition for applying to a resist pattern includes a component (A) which is at least one compound selected from the group consisting of a metal oxide (a1), a polyacid (a2), a polyacid salt (a3), a hydrolyzable silane (a4), a hydrolysis product (a5) of the hydrolyzable silane, and a hydrolysis condensate (a6) of the hydrolyzable silane; and a component (B), which is an aqueous solvent, in which the hydrolyzable silane (a4) is (i) a hydrolyzable silane containing an organic group having an amino group, (ii) a hydrolyzable silane containing an organic group having an ionic functional group, (iii) a hydrolyzable silane containing an organic group having hydroxy group, or (iv) a hydrolyzable silane containing an organic group having a functional group convertible to hydroxy group.

  本发明提供了一种用于涂覆抗蚀剂图案并利用蚀刻率差异反转图案的组合物。一种用于涂覆抗蚀剂图案的组合物包括一种组分（A），它是至少一种选自由金属氧化物（a1）、多酸（a2）、多酸盐（a3）、可水解硅烷（a4）、可水解硅烷的水解产物（a5）和可水解硅烷的水解缩合物（a6）组成的组的化合物；和组分 (B)，它是一种水性溶剂，其中可水解硅烷 (a4) 是 (i) 含有氨基的有机基团的可水解硅烷，(ii) 含有离子官能团的有机基团的可水解硅烷，(iii) 含有羟基的有机基团的可水解硅烷，或 (iv) 含有可转换为羟基的官能团的有机基团的可水解硅烷。
• Method for producing resist pattern coating composition with use of solvent replacement method
  申请人：NISSAN CHEMICAL CORPORATION

  公开号：US11531269B2

  公开（公告）日：2022-12-20

  Method for producing coating composition applied to patterned resist film in lithography process for solvent development to reverse pattern. The method including: step obtaining hydrolysis condensation product by hydrolyzing and condensing hydrolyzable silane in non-alcoholic hydrophilic solvent; step of solvent replacement wherein non-alcoholic hydrophilic solvent replaced with hydrophobic solvent for hydrolysis condensation product. Method for producing semiconductor device, including: step of applying resist composition to substrate and forming resist film; step of exposing and developing formed resist film; step applying composition obtained by above production method to patterned resist film obtained during or after development in step, forming coating film between patterns; step of removing patterned resist film by etching and reversing patterns. Production method that exposure is performed using ArF laser (with wavelength of 193 nm) or EUV (with wavelength of 13.5 nm). Production method that development is negative development with organic solvent.

  在光刻工艺中用于图案抗蚀剂薄膜的涂层组合物的生产方法，用于溶剂显影以反转图案。该方法包括：通过在非醇类亲水溶剂中水解和冷凝可水解硅烷，获得水解缩合产物的步骤；溶剂置换步骤，其中用疏水性溶剂置换非醇类亲水溶剂以获得水解缩合产物。生产半导体器件的方法，包括：将抗蚀剂组合物涂在基片上并形成抗蚀剂薄膜的步骤；对形成的抗蚀剂薄膜进行曝光和显影的步骤；将通过上述生产方法获得的组合物涂在步骤中显影期间或之后获得的图案抗蚀剂薄膜上，在图案之间形成涂膜的步骤；通过蚀刻和反转图案去除图案抗蚀剂薄膜的步骤。使用 ArF 激光（波长 193 纳米）或 EUV（波长 13.5 纳米）进行曝光的生产方法。使用有机溶剂进行负显影的生产方法。
• Method for delivering biologically active substnces
  申请人：Koller Stefan

  公开号：US20060019565A1

  公开（公告）日：2006-01-26

  The present application relates to a method for the controlled and/or slow release of a biologically active hydroxyl group containing-substance on a substrate which comprises reacting said hydroxyl group containing substance subsequently with a halogen-substituted aliphatic carboxylic acid halide and either a diamine containing at least one tertiary amino group or a heterocyclic aromatic amine, applying the thus obtained water-soluble ester to the substrate and finally hydrolysing the ester on the substrate.

  本申请涉及一种在基质上控制和/或缓慢释放具有生物活性的含羟基物质的方法，该方法包括将所述含羟基物质随后与卤素取代的脂肪族羧酸卤化物和含有至少一个叔氨基的二胺或杂环芳香胺反应，将由此获得的水溶性酯涂抹在基质上，最后水解基质上的酯。
• POLYMERIZABLE MONOMER, POLYMER THEREOF, AND PROCESS FOR PRODUCING THE SAME
  申请人：OTSUKA KAGAKU KABUSHIKI KAISHA

  公开号：EP0602254B1

  公开（公告）日：1997-01-02