Tris-(2-hexyloxy-ethyl)-amine

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: Tris-(2-hexyloxy-ethyl)-amine
• 英文别名: 2-hexoxy-N,N-bis(2-hexoxyethyl)ethanamine
• 化学式: C₂₄H₅₁NO₃
• 分子量: 401.7
• InChiKey: KTRBHWYAVSJAKJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.8
• 重原子数：
  28
• 可旋转键数：
  24
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  30.9
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• Silsesquioxane resin and oxaamine composition
  申请人：Dow Silicones Corporation

  公开号：US10990012B2

  公开（公告）日：2021-04-27

  A silsesquioxane-containing composition comprising a silsesquioxane resin and an oxaamine of formula (II) (see description), products prepared therefrom, photoresist compositions comprising the silsesquioxane-containing composition and a photoacid generator, products prepared therefrom, methods of making and using same, and manufactured articles and semiconductor devices containing same.

  一种含硅倍半氧烷的组合物，包括硅倍半氧烷树脂和一种式（II）的氧杂胺（见描述），由此制备的产品，含硅倍半氧烷组合物和一种光酸发生器的光刻胶组合物，由此制备的产品，制造和使用方法，以及含有这些成分的制成品和半导体器件。
• Chemically amplified positive photoresist composition and pattern forming method using same
  申请人：Ridgefield Acquisition

  公开号：US11029599B2

  公开（公告）日：2021-06-08

  The present invention relates to a photosensitive resin composition suitable for forming a thick film, which comprises (A) an alkali-soluble resin, (B) at least one plasticizer selected from a group consisting of an alkali-soluble vinyl resin and an acid-dissociable group containing vinyl resin, (C) an acid generator, and (D) an organic solvent.

  本发明涉及一种适用于形成厚膜的感光树脂组合物，该组合物包括：(A) 碱溶性树脂；(B) 至少一种增塑剂，该增塑剂选自碱溶性乙烯基树脂和含酸解离基团的乙烯基树脂组成的组；(C) 酸发生剂；(D) 有机溶剂。
• Pattern forming method, method for manufacturing electronic device, laminate film, and composition for forming upper layer film
  申请人：FUJIFILM Corporation

  公开号：US11249395B2

  公开（公告）日：2022-02-15

  One embodiment of the present invention provides a pattern forming method including a step for forming an actinic ray-sensitive or radiation-sensitive film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition, a step for forming an upper layer film on the actinic ray-sensitive or radiation-sensitive film using a composition for forming an upper layer film, a step for exposing a laminate film including the actinic ray-sensitive or radiation-sensitive film and the upper layer film, and a step for developing the exposed laminate film using a developer including an organic solvent. The composition for forming an upper layer film contains a resin (XA), a resin (XB) containing fluorine atoms, a basic compound (XC), and a solvent (XD), and the resin (XA) is a resin not containing fluorine atoms, or in a case where the resin (XA) contains fluorine atoms, the resin (XA) is a resin having a lower content of fluorine atoms than that in the resin (XB), based on a mass.

  本发明的一个实施例提供了一种图案形成方法，包括使用感光树脂或辐射敏感树脂组合物在基底上形成感光膜或辐射敏感膜的步骤、使用用于形成上层薄膜的组合物在感光膜或辐射敏感膜上形成上层薄膜的步骤，曝光包括感光膜或辐射敏感膜和上层薄膜的层压薄膜的步骤，以及使用包括有机溶剂的显影剂显影曝光的层压薄膜的步骤。用于形成上层薄膜的组合物包含树脂 (XA)、含氟原子的树脂 (XB)、碱性化合物 (XC) 和溶剂 (XD)，并且树脂 (XA) 是不含氟原子的树脂，或者在树脂 (XA) 含有氟原子的情况下，树脂 (XA) 是氟原子含量低于树脂 (XB) 中氟原子含量的树脂（基于质量）。
• Polymer, resist protective coating material, and patterning process
  申请人：Harada Yuji

  公开号：US20080085466A1

  公开（公告）日：2008-04-10

  A resist protective coating material comprises a polymer comprising repeat units having formulae (1 a ) and (1 b ) and having a Mw of 1,000-500,000. R 1a and R 1b are H, F or alkyl or fluoroalkyl, R 2a , R 2b , R 3a and R 3b are H or alkyl, or R 2a and R 2b , and R 3a and R 3b may bond together to form a ring, 0
• Silsesquioxane Resin and Oxaamine Composition
  申请人：Dow Silicones Corporation

  公开号：US20190171106A1

  公开（公告）日：2019-06-06

  A silsesquioxane-containing composition comprising a silsesquioxane resin and an oxaamine of formula (II) (see description), products prepared therefrom, photoresist compositions comprising the silsesquioxane-containing composition and a photoacid generator, products prepared therefrom, methods of making and using same, and manufactured articles and semiconductor devices containing same.