N,N,N',N',N'',N''-六(乙氧基甲基)-1,3,5-三嗪-2,4,6-三胺 | 10193-52-9

• 分子结构分类: 有机化合物 - 有机氮化合物
• 中文名称: N,N,N',N',N'',N''-六(乙氧基甲基)-1,3,5-三嗪-2,4,6-三胺
• 英文名称: N-Hexakis-(ethoxymethyl)-melamin
• 英文别名: hexakis-N-ethoxymethyl-[1,3,5]triazine-2,4,6-triamine；s-Triazine-1,3,5-triamine, hexakis(ethoxymethyl)-；2-N,2-N,4-N,4-N,6-N,6-N-hexakis(ethoxymethyl)-1,3,5-triazine-2,4,6-triamine
• CAS: 10193-52-9
• 化学式: C₂₁H₄₂N₆O₆
• 分子量: 474.601
• InChiKey: PEDRIHRZXCQSBN-UHFFFAOYSA-N

物化性质

• 熔点：
  35-38 °C
• 沸点：
  555.8±60.0 °C(Predicted)
• 密度：
  1.131±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  33
• 可旋转键数：
  21
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  104
• 氢给体数：
  0
• 氢受体数：
  12

安全信息

• 海关编码：
  2933699090

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20160145231A1

  公开（公告）日：2016-05-26

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。
• OPTICAL COMPONENT FORMING COMPOSITION AND CURED PRODUCT THEREOF
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20200262787A1

  公开（公告）日：2020-08-20

  The present invention provides an optical component forming composition comprising a tellurium-containing compound or a tellurium-containing resin.

  本发明提供了一种包括含碲化合物或含碲树脂的光学元件成型组合物。
• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM
  申请人：Enomoto Yuichiro

  公开号：US20120282548A1

  公开（公告）日：2012-11-08

  Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.

  提供的是一种形成图案的方法，包括(i)使用光致或辐射敏感树脂组成物形成薄膜的步骤，(ii)曝光薄膜的步骤，以及(iii)使用有机溶剂含有的显影剂显影曝光后的薄膜的步骤，其中光致或辐射敏感树脂组成物包括(A)一种能够通过酸的作用降低有机溶剂含有的显影剂的溶解度的树脂，(B)一种能够在光致或辐射照射下生成酸的化合物，(D)一种溶剂，以及(G)一种具有氟原子和硅原子中的至少一种，并具有碱性或能够通过酸的作用增加碱性的化合物。
• Sulfonium salt compound
  申请人：——

  公开号：US20040033434A1

  公开（公告）日：2004-02-19

  A compound shown by the general formula [1] 1 (wherein R 1 , R 2 and R 3 are each independently an aromatic hydrocarbon residual group, Y n− is an anion derived from a carboxylic acid having 3 or more carbon atoms with substituted fluorine atoms, and n is 1 or 2, provided that R 1 , R 2 and R 3 each is not a phenyl group having substituents at an ortho and/or a meta position), and a composition consisting of the compound and a diazodisulfone compound are disclosed. Use of the compound or the compound as an acid generator for resists produces the effects of improving the profiles of ultra-fine patterns or diminishing sidewall irregularities in ultra-fine patterns. The compound is also useful as a cationic photopolymerization initiator.

  公式为[1]1的化合物被展示出来（其中R1、R2和R3各自独立地是芳香族碳氢残基，Yn−是源自具有3个或更多碳原子的羧酸的阴离子，其中含有取代的氟原子，n为1或2，前提是R1、R2和R3各自不是具有取代基的苯基，该取代基位于邻位和/或间位），并且由该化合物和一种二硫酰二氮化合物组成的组合物被公开。使用该化合物或该化合物作为酸发生剂用于光刻胶会产生改善超细图案轮廓或减少超细图案侧壁不规则性的效果。该化合物还可用作阳离子光聚合引发剂。
• CYCLIC COMPOUND, PRODUCTION PROCESS THEREOF, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD
  申请人：Takasuka Masaaki

  公开号：US20120282546A1

  公开（公告）日：2012-11-08

  Disclosed are: a cyclic compound which has high solubility in a safe solvent, is highly sensitive, enables the formation of a resist pattern having a good shape, and rarely causes resist pattern collapse; a process for producing the cyclic compound; a radiation-sensitive composition containing the cyclic compound; and a resist pattern formation method using the composition. Specifically disclosed are: a cyclic compound having a specific structure; a process for producing the cyclic compound; a radiation-sensitive composition containing the compound; and a resist pattern formation method using the composition.

  本发明涉及一种具有高溶解度、高灵敏度、能够形成良好形状的抗蚀图案，且很少引起抗蚀图案崩塌的环状化合物；一种制备该环状化合物的方法；一种含有该环状化合物的辐射敏感组合物；以及使用该组合物的抗蚀图案形成方法。具体揭示了一种具有特定结构的环状化合物，制备该环状化合物的方法，含有该化合物的辐射敏感组合物以及使用该组合物的抗蚀图案形成方法。