[EN] CURABLE FORMULATION WITH HIGH REFRACTIVE INDEX AND ITS APPLICATION IN SURFACE RELIEF GRATING USING NANOIMPRINTING LITHOGRAPHY<br/>[FR] FORMULATION DURCISSABLE À INDICE DE RÉFRACTION ÉLEVÉ, ET SON APPLICATION DANS UN RÉSEAU À RELIEF DE SURFACE PAR LITHOGRAPHIE PAR NANO-IMPRESSION
                        
                            
                                申请人:FACEBOOK TECHNOLOGIES LLC
                            
                            
                                公开号:WO2020163334A1
                            
                            
                                公开(公告)日:2020-08-13
                            
                            Disclosed herein is a nanoimprint lithography (NIL) precursor material comprising a base resin component having a first refractive index ranging from 1.45 to 1.80, and a nanoparticles component having a second refractive index greater than the first refractive index of the base resin component. According to certain embodiments, further disclosed herein are a cured NIL material made by curing the NIL precursor material, a NIL grating comprising the cured NIL material, an optical component comprising the NIL grating, and methods for forming the NIL grating and the optical component using a NIL process.