Pentadecafluorooctanoate | 45285-51-6

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: Pentadecafluorooctanoate
• 英文别名: 2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-pentadecafluorooctanoate
• CAS: 45285-51-6
• 化学式: C8F15O2-
• 分子量: 413.06
• InChiKey: SNGREZUHAYWORS-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  5.6
• 重原子数：
  25
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  40.1
• 氢给体数：
  0
• 氢受体数：
  17

反应信息

• 作为反应物：
  描述：

  2-Hydroxy-2-(3-methoxyphenyl)-1-phenylethanone 、 十八烷酰氯 、 安息香精油 、 1-hexadecanesulfonate ion 、 Pentadecafluorooctanoate 、 、 在 ice 、 amine 作用下， 以 三乙胺 、 甲苯 为溶剂， 反应 1.0h， 生成 3'-Methoxybenzoin octadecanoate
  参考文献：
  名称：

  Photolabile blocked surfactants and compositions containing the same

  摘要：

  本发明提供了一种通过光敏保护或掩蔽基团阻止表面活性剂作用（在此被识别为“光敏可逆阻塞表面活性剂”），但在暴露于光致辐射后变得未被阻塞的表面活性剂。通过将光敏可逆阻塞表面活性剂与聚合物成膜材料混合，可以制备出表面活性剂在辐射下形成的涂层组合物。含有光敏可逆阻塞表面活性剂的组合物在涂覆在各种基底上作为保护涂层或作为压敏胶带中的粘合剂时非常有用。虽然最初与基底粘附良好，但在暴露于适当辐射后，这些组合物可以轻松地从基底上去除，因为此时表面活性剂被解除阻塞以恢复其表面活性。

  公开号：

  US04599273A1

文献信息

• Photolabile blocked surfactants and compositions containing the same
  申请人：Minnesota Mining and Manufacturing Company

  公开号：US04740600A1

  公开（公告）日：1988-04-26

  Surfactants which are blocked against surfactant action (identified herein as "photolabile blocked surfactants") by a photolabile protective or masking group but which, on exposure to actinic radiation, become unblocked are provided. Coating compositions in which surfactant is formed on irradiation are provided by blending the photolabile blocked surfactant with polymeric film-forming materials. Compositions containing the photolabile blocked surfactants are useful when employed as protective coatings on various substrates or as the adhesive in a pressure sensitive adhesive tape. Although initially well adhering to a substrate, such compositions may be readily removed from the substrate following exposure of the same to suitable radiation which unblocks the surfactant to permit it to regain its surfactant activity.

  本发明提供了一种被光敏保护或掩蔽基团阻止表面活性剂作用（在此称为“光敏可溶性阻滞表面活性剂”），但在暴露于活性辐射时变得未被阻滞的表面活性剂。通过将光敏可溶性阻滞表面活性剂与聚合膜形成材料混合，可以形成在辐照下形成表面活性剂的涂层组合物。含有光敏可溶性阻滞表面活性剂的组合物在作为各种基材的保护涂层或压敏胶带中的粘合剂时非常有用。尽管最初与基材紧密粘合，但在将其暴露于适当辐射后，这些组合物可以轻松地从基材上移除，因为此时表面活性剂被解除阻滞，恢复了其表面活性。
• Photolabile blocked surfactants
  申请人：Minnesota Mining and Manufacturing Company

  公开号：US04980096A1

  公开（公告）日：1990-12-25

  Surfactants which are blocked against surfactant action (identified herein as "photolabile blocked surfactants") by a photolabile protective or masking group but which, on exposure to actinic radiation, become unblocked are provided. Coating compositions in which surfactant is formed on irradiation are provided by blending the photolabile blocked surfactant with polymeric film-forming materials. Compositions containing the photolabile blocked surfactants are useful when employed as protective coatings on various substrates or as the adhesive in a pressure sensitive adhesive tape. Although initially well adhering to a substrate, such compositions may be readily removed from the substrate following exposure of the same to suitable radiation which unblocks the surfactant to permit it to regain its surfactant activity.

  本文提供了一种被光敏保护或掩蔽基团阻止表面活性剂作用的表面活性剂（在此称为“光致敏阻断表面活性剂”），但在暴露于光致辐射后变得未被阻断的方法。通过将光致敏阻断表面活性剂与聚合膜形成材料混合，可以提供形成表面活性剂的涂层组成物。含有光致敏阻断表面活性剂的组成物在用作各种基底的保护涂层或作为压敏胶带中的粘合剂时非常有用。尽管最初与基底粘附良好，但在将其暴露于适当的辐射后，这些组成物可以轻松地从基底上取下，因为这样可以解除表面活性剂的阻断，使其恢复其表面活性。