α-Phenyl-p-chlor-zimtsaeure | 7466-99-1

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二苯乙烯类
• 英文名称: α-Phenyl-p-chlor-zimtsaeure
• 英文别名: alpha-Phenyl-4-chlorocinnamic acid；3-(4-chlorophenyl)-2-phenylprop-2-enoic acid
• CAS: 7466-99-1
• 化学式: C₁₅H₁₁ClO₂
• mdl: MFCD00017550
• 分子量: 258.704
• InChiKey: VRWKAXRIXMCDDY-UHFFFAOYSA-N

物化性质

• 熔点：
  202-203 °C
• 沸点：
  371.4±27.0 °C(Predicted)
• 密度：
  1.299±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4.1
• 重原子数：
  18
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  2

安全信息

• 海关编码：
  2916399090

反应信息

• 作为产物：
  描述：

  苯乙酸 、 4-氯苯甲醛 在 乙酸酐 、 三乙胺 作用下， 生成 α-Phenyl-p-chlor-zimtsaeure
  参考文献：
  名称：

  Photochemistry of Stilbenes. IV. The Preparation of Substituted Phenanthrenes^1a-c

  摘要：

  DOI：

  10.1021/jo01034a059

文献信息

• Light-sensitive materials
  申请人：Vickers Limited

  公开号：US04254244A1

  公开（公告）日：1981-03-03

  A light sensitive material suitable for coating onto a support to produce a light sensitive plate for use in, for example, the manufacture of a printing plate comprises groups of the formula: ##STR1## attached to carbon atoms, wherein ##STR2## wherein R.sub.5 represents a hydrogen atom or an alkyl group; R is an aromatic radical; a is zero or unity; R.sub.1, R.sub.2 and R.sub.3 are hydrogen atoms, halogen atoms, cyano groups, or specified aliphatic or aromatic groups; X is a deactivating group; R.sub.4 is a hydrogen atom, a carboxyl group, a cyano group or a specified aliphatic or aromatic group; and Ph is a phenyl group. The material may be produced by reacting a polymer containing epoxide groups, hydroxyl groups, or primary and/or secondary amino groups with the halosulphonyl group of a compound having the forula: ##STR3## wherein R, R.sub.1, R.sub.2 R.sub.3, and a have the above meanings, wherein X has the above meaning or is a halosulphonyl group and R.sub.4 has the above mentioned meaning or, in the case where X is a deactivating group, is a halosulphonyl substituted group.

  一种适合涂覆在支撑物上以制成光敏板的光敏材料，例如用于制造印刷版，包括式子的基团：##STR1##连接到碳原子上，其中##STR2##其中R.sub.5代表氢原子或烷基；R是芳基；a为零或统一；R.sub.1、R.sub.2和R.sub.3为氢原子、卤素原子、氰基或指定的脂肪或芳香族基团；X为去活化基团；R.sub.4为氢原子、羧基、氰基或指定的脂肪或芳香族基团；Ph为苯基。该材料可以通过将含有环氧基团、羟基或主要和/或次要氨基团的聚合物与具有式子的卤磺酰基团的化合物反应而制得：##STR3##其中R、R.sub.1、R.sub.2、R.sub.3和a具有上述含义，其中X具有上述含义或是卤磺酰基团，而R.sub.4具有上述提到的含义，或者，在X是去活化基团的情况下，是卤磺酰取代基团。
• Light sensitive materials
  申请人：Vickers Limited

  公开号：US04117039A1

  公开（公告）日：1978-09-26

  A light sensitive material suitable for coating onto a support to produce a light sensitive plate for use in, for example, the manufacture of a printing plate comprises groups of the formula: ##STR1## attached to carbon atoms of a polymer, wherein --Z-- is --o-- or ##STR2## or ##STR3## wherein R.sub.5 represents a hydrogen atom or an alkyl group; R is an aromatic radical; a is zero or unity; R.sub.1, R.sub.2 and R.sub.3 are hydrogen atoms, halogen atoms, cyano groups, or specified aliphatic or aromatic groups; X is a deactivating group; R.sub.4 is a hydrogen atom, a carboxyl group, a cyano group or a specified aliphatic or aromatic group; and Ph is a phenyl group. The material may be produced by reacting a polymer containing epoxide groups, hydroxyl groups, or primary and/or secondary amino groups with the halosulphonyl group of a compound having the formula: ##STR4## wherein R, R.sub.1, R.sub.2 R.sub.3, and a having the above meanings, wherein X has the above meaning or is a halosulphonyl group and R.sub.4 has the above meaning or, in the case where X is a deactivating group, is a halosulphonyl substituted group.

  适合涂覆到支撑材料上以制造光敏版，例如用于制造印刷版的光敏材料，包括具有以下式子的基团：##STR1## 连接到聚合物的碳原子上，其中--Z--是--o--或##STR2##或##STR3##，其中R5代表氢原子或烷基；R是芳香基团；a为零或单位；R1、R2和R3为氢原子、卤素原子、氰基或指定的脂肪族或芳香族基团；X为失活基团；R4为氢原子、羧基、氰基或指定的脂肪族或芳香族基团；Ph为苯基团。该材料可以通过将含有环氧基团、羟基或一级和/或二级氨基团的聚合物与具有以下式子的化合物的卤代磺酰基反应而制得：##STR4## 其中R、R1、R2、R3和a具有上述含义，其中X具有上述含义或是卤代磺酰基，而R4具有上述含义或在X为失活基团的情况下，是卤代磺酰基取代的基团。
• Photochemistry of Stilbenes. IV. The Preparation of Substituted Phenanthrenes^1a-c
  作者：Clelia S. Wood、Frank B. Mallory

  DOI：10.1021/jo01034a059

  日期：1964.11
• Chandra,V.; Srivastava,V.B., Journal of the Indian Chemical Society, 1966, vol. 43, # 12, p. 796 - 800
  作者：Chandra,V.、Srivastava,V.B.

  DOI：——

  日期：——