申请人:E. R. Squibb & Sons, Inc.
公开号:US03996363A1
公开(公告)日:1976-12-07
Compounds of the following formula and their acid addition salts ##STR1## wherein R.sup.1 and R.sup.2 are selected from hydrogen, lower alkyl, lower alkoxy, lower alkylthio, halogen, trifluoromethyl, amino, nitro and cyano; R.sup.3 is hydrogen, lower alkyl or lower alkenyl; R.sup.4 is hydrogen, halogen, or lower alkyl; and A is straight or branched chain alkylene are disclosed. These compounds exhibit antidepressant activity. In addition, these compounds are useful as antiinflammatory agents.
以下公式的化合物及其酸盐 ##STR1## 其中 R.sup.1 和 R.sup.2 选自氢、低烷基、低烷氧基、低硫代烷基、卤素、三氟甲基、氨基、硝基和氰基;R.sup.3 为氢、低烷基或低烯基;R.sup.4 为氢、卤素或低烷基;A 为直链或支链烷基。这些化合物具有抗抑郁活性。此外,这些化合物可用作抗炎药。