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N-十二烷基-1-羟基-2-萘甲酰胺 | 28279-38-1

中文名称
N-十二烷基-1-羟基-2-萘甲酰胺
中文别名
——
英文名称
N-dodecyl-1-hydroxy-2-naphthalenecarboxamide
英文别名
N-dodecyl-1-hydroxy-2-naphtalenecarboxamide;N-dodecyl-1-hydroxynaphthalene-2-carboxamide
N-十二烷基-1-羟基-2-萘甲酰胺化学式
CAS
28279-38-1
化学式
C23H33NO2
mdl
——
分子量
355.521
InChiKey
ICBKTKTWBGPHAY-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    538.1±33.0 °C(Predicted)
  • 密度:
    1.033±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    8.2
  • 重原子数:
    26
  • 可旋转键数:
    12
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.52
  • 拓扑面积:
    49.3
  • 氢给体数:
    2
  • 氢受体数:
    2

安全信息

  • 海关编码:
    2924299090

文献信息

  • Base precursor
    申请人:FUJI PHOTO FILM CO., LTD.
    公开号:EP0120402A1
    公开(公告)日:1984-10-03
    A base precursor represented by the following general formula (A) or (B): Wherein A1, A2, A5, A6, A7, and A8 each represents a hydrogen atom, an alkyl group, a substituted alkyl group, a cycloalkyl group, an alkenyl group, an aralkyl group, an aryl group, a substituted aryl group, an acyl group, or a heterocyclic group, and A1 and A2 can combine to form a ring and two of A5, A6, A7, and A8 can combine to form a ring, A3 and A4 each represents a hydrogen atom, an alkyl group, a substituted alkyl group, a cycloalkyl group, or an aralkyl group, and A3 and A. can combine to form a ring or A3 and A. can be a double bond forming an imino group from and X represents a nucleophilic group.
    由以下通式(A)或(B)代表的碱前体: 其中 A1、A2、A5、A6、A7 和 A8 各代表氢原子、烷基、取代烷基、环烷基、烯基、芳基、取代芳基、酰基或杂环基、A1和A2可结合形成一个环,A5、A6、A7和A8中的两个可结合形成一个环,A3和A4各自代表一个氢原子、一个烷基、一个取代的烷基、一个环烷基或一个芳烷基,A3和A.可以结合形成一个环,或 A3 和 A. 可以是一个双键,形成一个亚基基团。 和 X 代表亲核基团。
  • A base precursor for heat-developable photosensitive material
    申请人:FUJI PHOTO FILM CO., LTD.
    公开号:EP0123937A1
    公开(公告)日:1984-11-07
    A base precursor for heat-developable photosensitive material is disclosed. The precursor is comprised of a compound represented by general formula (1) or (II): The substituents within the genral formulae are dfined within the specification. The use of this novel base precur- sur makes it possible to obtain a material which is very stable at normal temperatures and which smoothly decomposes under heating at 80°C or higher in order to release a basic constituent.
    本发明公开了一种用于热显影感光材料的基质前体。该前体由通式 (1) 或 (II) 所代表的化合物组成: 通式中的取代基在说明书中作了规定。使用这种新型基前体可以获得一种在常温下非常稳定的材料,这种材料在 80°C 或更高温度下加热时会顺利分解,从而释放出一种基本成分。
  • Heat-developable light-sensitive material
    申请人:FUJI PHOTO FILM CO., LTD.
    公开号:EP0177033A2
    公开(公告)日:1986-04-09
    A heat-developable light-sensitive material is described, containing a compound represented by formula (1) wherein R, represents a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted heterocyclic group, a substituted or unsubstituted alkylene group, a substituted or unsubstituted cycloalkylene group, a substituted or unsubstituted alkenylene group, a substituted or uasubstituted alkynylene group, a substituted or unsubstituted aralkylene group, a substituted or unsubstituted arylene group, or a substituted or unsubstituted divalent heterocyclic group; R2 represents a hydrogen atom, a substituted or unsubstituted alkyl group; R3 represents an alkyl group, an alkoxyl group, a halogen atom, an acylamino group, a sulfonylamino group, an alkylamino group, a dialkylamino group, an alkylsulfonyl group, an arylsulfonyl group, a cyano group, a substituted or unsubstituted carbamoyl group, a substituted or unsubstituted sulfamoyl group or an alkoxycarbonyl group; X represents a divalent group selected from (wherein R4 represents a hydrogen atom, a substituted or unsubstituted alkyl group), (wherein R5 represents a substituted or unsubstituted alkyl group), and M represents an alkali metal, an alkaline earth metal, a quaternary ammonium group, or an ammonium group represented by BH (wherein B represents an organic base); is an integer of 0 to 3; and m and n are each an integer of 1 or 2, such that the electric charge of carboxylate anion is equivalent to that of M. This material is improved in activity and storage stability. That is, the material providing an image of high density and decreased fog, and which even when stored under high temperature high humidity conditions, maintained good photographic performance.
    所述的一种热显影光敏材料含有由式(1)代表的化合物 其中 R 代表氢原子、取代或未取代的烷基、取代或未取代的环烷基、取代或未取代的烯基、取代或未取代的炔基、取代或未取代的芳基、取代或未取代的芳基、取代或未取代的杂环基、取代或未取代的亚烷基、取代或未取代的环亚烷基、取代或未取代的烯基、取代或未 取代的炔基、取代或未取代的芳基、取代或未取代的二价杂环基;R2 代表氢原子、取代或未取代的烷基; R3 代表烷基、烷氧基、卤素原子、酰基、磺酰基、烷基基、二烷基基、烷基磺酰基、芳基磺酰基、基、取代或未取代的基甲酰基、取代或未取代的基磺酰基或烷氧羰基; X 代表选自以下各项的二价基团: 1. (其中 R4 代表氢原子、取代或未取代的烷基)、 (其中 R5 代表取代或未取代的烷基),以及 M 代表碱属、碱土属、季基团或由 BH 代表的基团(其中 B 代表有机碱);是 0 至 3 的整数;m 和 n 分别是 1 或 2 的整数,从而使羧酸阴离子的电荷与 M 的电荷相等。 这种材料在活性和储存稳定性方面都有所改进。也就是说,这种材料能提供高密度图像,减少雾气,即使在高温高湿条件下储存,也能保持良好的照相性能。
  • Radiation curable silicone composition
    申请人:GENERAL ELECTRIC COMPANY
    公开号:EP1099737A1
    公开(公告)日:2001-05-16
    A radiation curable composition contains an epoxy-functional silicone polymer, an iodonium photocatalyst and a polycyclic aromatic compound containing at least one hydroxy, alkoxy or glycidyl ether substituent bonded to an aromatic carbon atom of the compound.
    一种可辐射固化的组合物含有环氧官能团有机聚合物、光催化剂和一种多环芳香族化合物,该化合物含有至少一个与芳香族碳原子键合的羟基、烷氧基或缩水甘油醚取代基。
  • POLYVINYL ACETAL RESIN FOR HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL AND HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL
    申请人:SEKISUI CHEMICAL CO., LTD.
    公开号:EP1270608A1
    公开(公告)日:2003-01-02
    The present invention has an object    to provide a polyvinyl acetal resin for heat-developable photosensitive materials as well as a heat-developable photosensitive material while solving such problems as coating solution pot life, coloration of heat-developable photosensitive material, fog, poor gradation, insufficient sensitivity and poor undeveloped film storability and making it possible for the materials to acquire good image characteristics. The present invention is constituted of a polyvinyl acetal resin for heat-developable photosensitive materials    which is a polyvinyl acetal resin synthesized by the acetalization reaction between a polyvinyl alcohol and an aldehyde and    which comprises having a degree of polymerization of 200 to 3, 000, a residual acetyl group content of 0 to 25 mole percent and a residual hydroxyl group content of 17 to 35 mole percent, as calculated while regarding one acetal group as two acetalized hydroxyl groups, a water content of not more than 2.5% by weight and a residual aldehyde content of not more than 10 ppm and is free of any antioxidant.
    本发明的目的是 提供一种用于热显影感光材料的聚乙烯醇缩醛树脂以及一种热显影感光材料,同时解决涂层溶液的罐装寿命、热显影感光材料的着色、雾化、色阶差、感光度不足和未显影胶片的耐储存性差等问题,并使材料获得良好的图像特性成为可能。 本发明由用于热显影感光材料的聚乙烯醇缩醛树脂构成 它是由聚乙烯醇和醛之间的缩醛反应合成的聚乙烯醇缩醛树脂,并且 其聚合度为 200 至 3,000,残余乙酰基含量为 0 至 25 摩尔%,残余羟基含量为 17 至 35 摩尔%(计算时将一个缩醛基视为两个缩醛羟基),含量不超过 2.5%(重量百分比),残余醛含量不超过 10 ppm,且不含任何抗氧化剂
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