Tribromessigsaeure-piperidid | 1796-26-5

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 哌啶类
• 英文名称: Tribromessigsaeure-piperidid
• 英文别名: 2,2,2-Tribromo-1-piperidin-1-ylethanone
• CAS: 1796-26-5
• 化学式: C₇H₁₀Br₃NO
• 分子量: 363.874
• InChiKey: PNQKGUABPCNSAZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.9
• 重原子数：
  12
• 可旋转键数：
  0
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  20.3
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  苯乙烯 、 在 bis{rhodium[3,3'-(1,3-phenylene)bis(2,2-dimethylpropanoic acid)]} 作用下， 以 二氯甲烷 、 甲苯 为溶剂， 反应 1.0h， 生成 2,2-二溴-1-哌啶-1-基乙酮 、 Tribromessigsaeure-piperidid 、 trans-7-bromo-1-azabicyclo[4.2.0]octan-8-one 、 endo-5-bromo-1-azabicyclo[4.2.0]octan-8-one 、
  参考文献：
  名称：

  重氮化合物的亲核卤化反应，卤代重氮化合物合成的补充原理：实验和理论研究

  摘要：

  首次提出了三种重氮酯，重氮膦酸酯和重氮哌啶基酰胺的亲核卤化新方法，作为我们先前报道的亲电卤化的补充方法。基于高价α-芳基重氮三氟甲磺酸盐1A，2A和3A，相应的卤代重氮化合物是通过卤化四丁基铵或卤化钾的亲核卤化反应生成的。卤代重氮酸酯和卤代重氮膦酸酯的后续分子间环丙烷化反应以及溴化重氮哌啶基酰胺的分子内热–CH插入反应可在两步后以中等至良好的产率获得。DFT计算被呈现为diazoesters得到洞察亲核取代机理与过渡态与中性亲核试剂二甲硫和三乙胺，并用溴溴化- 。

  DOI：

  10.1021/jo401050c

文献信息

• Photosensitive composition, photosensitive lithography plate and method for producing lithography plate
  申请人：Matsumura Toshiyuki

  公开号：US20070020555A1

  公开（公告）日：2007-01-25

  Disclosed is a light sensitive composition containing a compound A having a group capable of undergoing radical polymerization, a compound B having a group capable of undergoing cationic polymerization, a photopolymerization initiator C, and a polymer binder D, the light sensitive composition being characterized in that the photopolymerization initiator C comprises an iron-arene complex and a halogenated alkyl group-containing compound.
• PLANOGRAPHIC PRINTING PLATE MATERIAL, AND CYCLIC UREIDE MOIETY-CONTAINING PHENOLIC RESIN AND ITS SYNTHETIC PROCESS
  申请人：MIYOSHI Masaki

  公开号：US20090075201A1

  公开（公告）日：2009-03-19

  Disclosed is a planographic printing plate material comprising an aluminum support and provided thereon, an image formation layer containing a cyclic ureide moiety-containing phenolic resin in which a phenolic resin has a cyclic ureide moiety through a linkage group, the cyclic ureide moiety being derived from a cyclic ureide and the linkage group being derived from a linkage compound having both a monohalogenated alkyl group and one selected from a vinyl group, a carbonyl group, an ester group and a sulfonic acid ester group.
• ETHYLENICALLY UNSATURATED COMPOUND, LIGHT SENSITIVE COMPOSITION, LIGHT SENSITIVE PLANOGRAPHIC PRINTING PLATE MATERIAL AND PRINTING PROCESS EMPLOYING THE SAME
  申请人：Kuroki Takaaki

  公开号：US20090263744A1

  公开（公告）日：2009-10-22

  The present invention provides a novel ethylenically unsaturated compound which is highly sensitive to scanning exposure due to an ultraviolet to near-infrared laser and is cured to give good physical properties; a light sensitive composition providing good developability and high sensitivity and forming a high strength layer; a planographic printing plate material having advantages that good developability, high sensitivity and high strength layer are obtained, particularly a planographic printing plate material requiring no developing machine which are mounted on a printing press without any development, followed by printing and which provides excellent developability on a printing press and printing durability; and a printing process. The ethylenically unsaturated compound has in the molecule a photo-oxidation group and a polymerizable ethylenically unsaturated bond, and has a predetermined solubility in water or an aqueous alkali solution. The planographic printing plate material is characterized in that it comprises a support and provided thereon, a light sensitive layer containing the ethylenically unsaturated compound, a polyhalogen compound as a photopolymerization initiator, a water-soluble polymer binder as a polymer binder and an infrared absorbing agent.
• US7285375B2
  申请人：——

  公开号：US7285375B2

  公开（公告）日：2007-10-23