propyl-[1,3,5]triazinetrione | 32668-85-2

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 三嗪类
• 英文名称: propyl-[1,3,5]triazinetrione
• 英文别名: Propyl-[1,3,5]triazintrion；1-Propyl-1,3,5-triazinane-2,4,6-trione
• CAS: 32668-85-2
• 化学式: C₆H₉N₃O₃
• 分子量: 171.156
• InChiKey: VYVKXVSXGURHJH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.1
• 重原子数：
  12
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  78.5
• 氢给体数：
  2
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  1-Propyl-biuret 、 碳酸二乙酯 在 sodium ethanolate 作用下， 生成 propyl-[1,3,5]triazinetrione
  参考文献：
  名称：

  Anticonvulsant Drugs. VII. Some Monosubstituted Isocyanurates¹

  摘要：

  DOI：

  10.1021/ja01111a002

文献信息

• Epoxy resin composition
  申请人：HITACHI, LTD.

  公开号：EP0138209A2

  公开（公告）日：1985-04-24

  An epoxy resin composition containing as a latent hardener a diaminotriazine-modified imidazole compound and dicyandiamide is improved in the usable life of a solder resist ink composition and can give a solder resist also excellent in resistance to an electroless plating bath.

  一种含有二氨基三嗪改性咪唑化合物和双氰胺作为潜固化剂的环氧树脂组合物，可提高阻焊油墨组合物的使用寿命，并使阻焊油墨对无电解电镀浴的耐受性也非常出色。
• Quinazoline derivatives and antihypertensive preparations containing same as effective components
  申请人：MITSUI PETROCHEMICAL INDUSTRIES, LTD.

  公开号：EP0188094A2

  公开（公告）日：1986-07-23

  Disclosed herein is an antihypertensive preparation containing, as an active component, a novel quinazoline derivative represented by the following general formula or a saft thereof: wherein R100 means a hydrogen atom or methoxy group, R200 and R300 denote individually a hydrogen atom or lower alkoxy group, R400is a hydrogen atom or amino group, stands for 2 or 3, and Het is a specific hetero ring group.

  本发明公开了一种抗高血压制剂，其活性成分含有由以下通式代表的新型喹唑啉衍生物或其 翻版： 其中 R100 表示氢原子或甲氧基，R200 和 R300 分别表示氢原子或低级烷氧基，R400 是氢原子或氨基，代表 2 或 3，Het 是特定的杂环基团。
• ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER
  申请人：Nissan Chemical Industries, Ltd.

  公开号：EP1757986A1

  公开（公告）日：2007-02-28

  There is provided an anti-reflective coating forming composition comprising a polymer having a pyrimidinetrione structure, imidazolidinedione structure, imidazolidinetrione structure or triazinetrione structure and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, and can use in lithography process by use of a light having a short wavelength such as ArF excimer laser beam (wavelength 193 nm) or F2 excimer laser beam (wavelength 157 nm), etc.

  本发明提供了一种抗反射涂层成型组合物，该组合物由具有嘧啶三酮结构、咪唑烷二酮结构、咪唑烷三酮结构或三嗪三酮结构的聚合物和溶剂组成。由该组合物制得的防反射涂层对反射光有很好的防止效果，不会与光刻胶混合，并可在光刻工艺中使用 ArF 准分子激光束（波长 193 nm）或 F2 准分子激光束（波长 157 nm）等短波长光。
• SULFONIC-ESTER-CONTAINING COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM FOR LITHOGRAPHY
  申请人：Nissan Chemical Industries, Ltd.

  公开号：EP1813987A1

  公开（公告）日：2007-08-01

  There is provided an anti-reflective coating forming composition for lithography comprising a polymer compound, a crosslinking compound, a crosslinking catalyst, a sulfonate compound and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, has a higher dry etching rate compared with photoresists, can form a photoresist pattern having no footing at the lower part, and can use in lithography process by use of a light such as ArF excimer laser beam and F2 excimer laser beam, etc.

  本发明提供了一种用于光刻的抗反射涂层形成组合物，该组合物由聚合物化合物、交联化合物、交联催化剂、磺酸盐化合物和溶剂组成。由该组合物制得的抗反射涂层对反射光有很好的防止效果，不会与光刻胶混合，与光刻胶相比具有更高的干蚀刻率，可以形成下部无基底的光刻胶图案，并可在光刻工艺中使用 ArF 准分子激光束和 F2 准分子激光束等光源。
• ASSOCIATIVE POLYMERS AND RELATED COMPOSITIONS, METHODS AND SYSTEMS
  申请人：California Institute of Technology

  公开号：EP3611228A1

  公开（公告）日：2020-02-19

  Described herein are associative polymers capable of controlling one or more physical and/or chemical properties of non-polar compositions and related compositions, methods and systems.

  本文描述了能够控制非极性组合物及相关组合物、方法和系统的一种或多种物理和/或化学性质的缔合聚合物。