4,4'-[(4-hydroxyphenyl)methylene]bis(2-methylphenol) | 48201-21-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 三苯基化合物
• 英文名称: 4,4'-[(4-hydroxyphenyl)methylene]bis(2-methylphenol)
• 英文别名: bis-(4-hydroxy-3-methyl-phenyl)-(4-hydroxy-phenyl)-methane；Bis-(4-hydroxy-3-methyl-phenyl)-(4-hydroxy-phenyl)-methan；4-[(4-Hydroxy-3-methylphenyl)-(4-hydroxyphenyl)methyl]-2-methylphenol
• CAS: 48201-21-4
• 化学式: C₂₁H₂₀O₃
• 分子量: 320.388
• InChiKey: OXJMWJCOJFLNJE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5
• 重原子数：
  24
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  60.7
• 氢给体数：
  3
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  对羟基苯甲醛 、 邻甲酚 在 硫酸 作用下， 生成 4,4'-[(4-hydroxyphenyl)methylene]bis(2-methylphenol)
  参考文献：
  名称：

  酚与羟基苯甲醛缩合制得的三苯甲烷衍生物

  摘要：

  DOI：

  10.1039/jr9540000985

文献信息

• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITIONS, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20190169211A1

  公开（公告）日：2019-06-06

  The present invention has been made in view of the circumstances herein. An object of the present invention is to provide: a tetracarboxylic dianhydride which can lead to a polyimide usable as a base resin of a photosensitive resin composition capable of forming a fine pattern and obtaining high resolution without impairing excellent characteristics such as mechanical strength and adhesiveness; a polyimide resin obtained by using the tetracarboxylic dianhydride; and a method for producing the polyimide resin. The tetracarboxylic dianhydride is shown by the following general formula (1).

  本发明是基于本文中的情况而作出的。本发明的目的是提供：一种四羧酸二酐，可导致聚酰亚胺，作为感光树脂组合物的基树脂，能够形成细微图案并获得高分辨率，同时不损害优异的特性，如机械强度和粘附性；通过使用该四羧酸二酐获得的聚酰亚胺树脂；以及生产该聚酰亚胺树脂的方法。该四羧酸二酐由以下通用式（1）所示。
• Positive photosensitive resin composition, photo-curable dry film and method for producing the same, patterning process, and laminate
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US10197914B2

  公开（公告）日：2019-02-05

  The present invention provides a positive photosensitive resin composition containing (A) a polymer compound containing a siloxane chain, the polymer compound having a repeating unit shown by the general formula (1) and a weight average molecular weight of 3,000 to 500,000, (B) a photosensitive material capable of generating an acid by light and increasing a dissolution rate in an aqueous alkaline solution, (C) a crosslinking agent, and (D) a solvent. There can be provided a positive photosensitive resin composition that can remedy the problem of delamination caused on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern having a forward tapered shape without generating a scum and a footing profile in the pattern bottom and on the substrate when a widely used 2.38% TMAH aqueous solution is used as the developer.

  本发明提供了一种含有（A）含有硅氧烷链的聚合物化合物的阳性感光树脂组合物，该聚合物化合物具有由通式（1）所示的重复单元和重量平均分子量为3,000至500,000，（B）能够通过光生成酸并增加在水性碱性溶液中的溶解速率的感光材料，（C）交联剂和（D）溶剂。可以提供一种阳性感光树脂组合物，可以解决在金属线路（如Cu和Al）、电极和基板上引起的剥离问题，特别是在SiN等基板上，可以在使用广泛的2.38％TMAH水溶液作为显影剂时，在图案底部和基板上形成具有前向锥形形状的细微图案，而不会产生污点和底部轮廓。
• NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT
  申请人：International Business Machines Corporation

  公开号：US20210317270A1

  公开（公告）日：2021-10-14

  Provided is a compound that can be used as a base resin for a photosensitive resin composition. The photosensitive resin can form a fine pattern and can achieve high resolution without impairing mechanical strength and solubility. The compound is represented by the general formula (1): wherein Z represents a linear, branched or cyclic divalent hydrocarbon group having 2 to 30 carbon atoms; X 1 to X 3 represent any of —CO 2 —, —CONR X1 —, —O—, —NR X1 —, —S—, —SO 2 —, —SO 3 — and —SO 2 NR X1 — and may be the same as or different from each other, provided that R X1 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 30 carbon atoms; Ar represents a divalent aromatic group having 2 to 30 carbon atoms; L 1 and L 2 independently represent a divalent hydrocarbon group having 1 to 30 carbon atoms; and x and y are each independently 0 or 1.

  提供的是一种可以用作光敏树脂组合物的基树脂的化合物。这种光敏树脂可以形成精细图案，并且可以在不影响机械强度和溶解性的情况下实现高分辨率。该化合物由通式（1）表示：其中Z代表具有2到30个碳原子的线性、支链或环状二价碳氢基团；X1到X3代表任何一种—CO2—、—CONRX1—、—O—、—NRX1—、—S—、—SO2—、—SO3—和—SO2NRX1—中的一种，并且它们可以相同也可以不同，只要RX1是氢原子或具有1到30个碳原子的一价碳氢基团；Ar代表具有2到30个碳原子的二价芳香基团；L1和L2分别代表具有1到30个碳原子的二价碳氢基团；x和y分别独立地为0或1。
• HIGHLY HEAT-RESISTANT, HIGH-PURITY POLYARYLATE AND FILM PRODUCED FROM THE SAME
  申请人：UNITIKA LTD.

  公开号：EP0943640A1

  公开（公告）日：1999-09-22

  The present invention provides a polyarylate film comprising 9,9-bis(alkyl-4-hydroxyphenyl)fluorene residue and bisphenol residue with a molar ratio of the former of in the range of 0.05 to 1 in which the carboxylic acid component is composed of terephthalic acid residue and isophthalic acid residue, wherein the polyarylate film having good abrasion resistance and heat resistance, being highly transparent and having less incident-angle dependent birefringence can be obtained by solvent casting of a polyarylate solution with an inherent viscosity in the range of 0.25 to 2.50. The film has high abrasion resistance, heat resistance and purity along with being excellent in such optical characteristics as high transparency and low birefringence, which is applicable as molding materials for use in electric, electronic and optical fields and in automobile industry; as insulating materials in electric appliances, power generators, capacitors and interlayer insulators; and as surface coating films as dielectric films for use in transformers, wire coating and capacitors, and substrates for liquid crystal display panel.

  本发明提供了一种聚芳酸酯薄膜，该薄膜由9,9-双(烷基-4-羟基苯基)芴残基和双酚残基组成，前者的摩尔比在0.其中羧酸组分由对苯二甲酸残留物和间苯二甲酸残留物组成，通过溶剂浇铸固有粘度在 0.25 至 2.50 范围内的聚芳酸酯溶液，可获得耐磨性和耐热性良好、透明度高且随事件角而产生的双折射较小的聚芳酸酯薄膜。这种薄膜具有很高的耐磨性、耐热性和纯度，同时还具有高透明度和低双折射等优异的光学特性，可用作电气、电子和光学领域以及汽车工业中的成型材料；用作电器、发电机、电容器和层间绝缘体中的绝缘材料；以及用作变压器、电线涂层和电容器中的介质薄膜和液晶显示面板基板的表面涂层薄膜。