Organo-silsesquioxane polymers for forming low-k dielectrics
申请人:Rantala T. Juha
公开号:US20060180900A1
公开(公告)日:2006-08-17
A low dielectric constant polymer, comprising monomeric units derived from a compound having the general formula I (R
1
—R
2
)
n
—Si—(X
1
)
4-n
, wherein each X
1
is independently selected from hydrogen and inorganic leaving groups, R
2
is an optional group and comprises an alkylene having 1 to 6 carbon atoms or an arylene, R
1
is a polycycloalkyl group and n is an integer 1 to 3. The polymer has excellent electrical and mechanical properties.