N,N'-dipropionyl-urea | 25844-05-7

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机碳酸及其衍生物
• 英文名称: N,N'-dipropionyl-urea
• 英文别名: N,N'-Dipropionyl-harnstoff；N-(propanoylcarbamoyl)propanamide
• CAS: 25844-05-7
• 化学式: C₇H₁₂N₂O₃
• 分子量: 172.184
• InChiKey: JOLIDQLJMAWAHQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1
• 重原子数：
  12
• 可旋转键数：
  2
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.57
• 拓扑面积：
  75.3
• 氢给体数：
  2
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  丙酰基脲 、 丙酸酐 在 硫酸 、 苯 作用下， 生成 N,N'-dipropionyl-urea
  参考文献：
  名称：

  Stoughton, Journal of Organic Chemistry, 1937, vol. 2, p. 518

  摘要：

  DOI：

文献信息

• Production method for polishing-material particles
  申请人：KONICA MINOLTA, INC.

  公开号：US10011752B2

  公开（公告）日：2018-07-03

  A production method for polishing-material particles, comprising: forming an inner layer having, as a main component thereof, a salt of at least one element selected from Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and the alkali earth metals; adding a prepared aqueous solution, at a prescribed time, to a reaction solution in which the salt formed from the element is dispersed, to form an outer layer on the outer side of the inner layer; using solid-liquid separation to separate a polishing-material-particle precursor from the reaction solution, and the polishing-material-particle precursor is baked; and the percentage of Ce in the reaction solution in which the surface of the outer layer is formed is in the range of 60-90 mol % inclusive.

  一种抛光材料颗粒的生产方法，包括形成内层，其主要成分为至少一种元素的盐，这些元素选自 Al、Sc、Ti、V、Cr、Mn、Fe、Co、Ni、Cu、Zn、Ga、Ge、Zr、In、Sn、Y、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、W、Bi、Th 和碱土金属；在规定的时间内，将制备好的水溶液加入到由元素形成的盐分散在其中的反应溶液中，在内层的外侧形成外层；使用固液分离法从反应溶液中分离出抛光材料颗粒前体，并对抛光材料颗粒前体进行烘烤；形成外层表面的反应溶液中 Ce 的百分比范围为 60-90 mol %（含）。
• Oligomers of Straight-Chain and Unbranched Fatty Acids and Drugs Containing These
  申请人：Wolf Hans Uwe

  公开号：US20090012166A1

  公开（公告）日：2009-01-08

  The present invention relates to new substances which are derived from naturally occurring straight-chain and unbranched fatty acids and also from semi-synthetic and synthetic compounds with principally the same structure in that they represent dimers, trimers, tetramers or higher oligomers of the starting substances.
• Abrasive Particles And Production Method Thereof
  申请人：KONICA MINOLTA, INC.

  公开号：US20150175864A1

  公开（公告）日：2015-06-25

  In order to use less cerium oxide and achieve higher durability and polishing speeds, these abrasive particles used in an abrasive have: a shell layer (3) which is the outermost shell layer of the abrasive particles and is formed with cerium oxide as the main component; and a middle layer (2) which contains cerium oxide and an oxide of at least one element selected from Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and the alkali earth metals, and which is formed closer to the center of the abrasive particles than the shell layer (3).
• Polishing Material Composition And Production Method Therefor
  申请人：KONICA MINOLTA, INC.

  公开号：US20150174734A1

  公开（公告）日：2015-06-25

  An abrasive composition to be used in an abrasive material, including an inorganic abrasive particle. The particle comprises a shell layer being an outermost layer and mainly composed of cerium oxide; and an intermediate layer comprising cerium oxide and an oxide of at least one element selected from the group consisting of Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and alkali earth metals and formed on an inner side of the shell layer. The abrasive composition also includes an organic base member comprising a polymerizable compound, wherein an outer surface of the organic base member is covered with the inorganic abrasive particle.
• Production Method For Polishing-Material Particles
  申请人：KONICA MINOLTA, INC.

  公开号：US20150232728A1

  公开（公告）日：2015-08-20

  A production method for polishing-material particles, comprising: forming an inner layer having, as a main component thereof, a salt of at least one element selected from Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and the alkali earth metals; adding a prepared aqueous solution, at a prescribed time, to a reaction solution in which the salt formed from the element is dispersed, to form an outer layer on the outer side of the inner layer; using solid-liquid separation to separate a polishing-material-particle precursor from the reaction solution, and the polishing-material-particle precursor is baked; and the percentage of Ce in the reaction solution in which the surface of the outer layer is formed is in the range of 60-90 mol% inclusive.