申请人:Hoechst-Roussel Pharmaceuticals, Inc.
公开号:US04780466A1
公开(公告)日:1988-10-25
There are disclosed compounds of the formula ##STR1## wherein the group A is ##STR2## where R.sub.1 and R.sub.2 are each independently hydrogen or loweralkyl, or R.sub.1 +R.sub.2 =(CH.sub.2).sub.m, m being 2 to 6, p is 1 or 2, and each X is independently hydrogen, loweralkyl, loweralkoxy, halogen, hydroxy, nitro, amino, loweralkylamino, diloweralkylamino, trifluoromethyl or loweralkylthio; W is O, H.sub.2 or [H, OH]; n is 2, 3 or 4; and R.sub.3 is ##STR3## where q is 1 or 2 and each Y is independently hydrogen, loweralkyl, loweralkoxy, halogen, hydroxy, nitro, amino, loweralkylamino, diloweralkylamino, trifluoromethyl or loweralkylthio, which are useful as antipsychotic, anxiolytic and analgesic agents.
公开了化合物的公式,其中A基团为##STR2##其中R.sub.1和R.sub.2各自独立地为氢或较低烷基,或R.sub.1 + R.sub.2 =(CH.sub.2).sub.m,其中m为2至6,p为1或2,每个X独立地为氢,较低烷基,较低烷氧基,卤素,羟基,硝基,氨基,较低烷基氨基,二较低烷基氨基,三氟甲基或较低烷基硫代基; W为O,H.sub.2或[H,OH];n为2、3或4;R.sub.3为##STR3##其中q为1或2,每个Y独立地为氢,较低烷基,较低烷氧基,卤素,羟基,硝基,氨基,较低烷基氨基,二较低烷基氨基,三氟甲基或较低烷基硫代基,这些化合物可用作抗精神病、抗焦虑和镇痛剂。