Styryl compounds, process for preparing the same and photoresist compositions comprising the same
申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:EP0323631A2
公开(公告)日:1989-07-12
A styryl compound of the formula:
wherein R₁, R₂ and R₁₁ are the same or different and a hydrogen atom, an optionally substituted alkyl, alkenyl or aralkyl group or R₁ and R₂ may form a ring together with the nitrogen atom to which they are bonded, which ring may include at least one hetero atom in addition to said nitrogen atom; R₁₀ is an optionally substituted alkylene group; R₃ is -OH, -OCOR₅ or -OSi(R₅)₃ in which R⁵ is an alkyl group; R₁₂ and R₁₃ are independently a hydrogen atom, an optionally substituted lower alkyl or alkoxy group, an amide group or a halogen atom; X, Y, W and Z are the same or different and an electron attracting group, and n is a number of 2-15, which is suitable as a light absorber in a photoresist composition.
式中的苯乙烯基化合物:
其中R₁、R₂和R₁₁是相同或不同的氢原子、任选取代的烷基、烯基或芳烷基,或者R₁和R₂可与它们所键合的氮原子一起形成一个环,该环除所述氮原子外还可包括至少一个杂原子;R₁₀是任选取代的亚烷基;R₃是-OH、-OCOR₅或-OSi(R₅)₃,其中 R⁵ 是烷基;R₁₂和 R₁₃ 独立地是氢原子、任选取代的低级烷基或烷氧基、酰胺基或卤素原子;X、Y、W 和 Z 是相同或不同的引电子基团,n 是 2-15 之间的数字,适合用作光刻胶组合物中的光吸收剂。