Kinetic study for the reactions of chlorine atoms with hexamethyldisiloxane, 1,1,3,3-tetramethyldisiloxane, and 1,3-dimethyldisiloxane
作者:Alexandros V. Prosmitis、Vassilis C. Papadimitriou、Josef Pola、Panos Papagiannakopoulos
DOI:10.1016/s0009-2614(01)00713-8
日期:2001.8
for the reactions of chlorine atoms with (CH3)3SiOSi(CH3)3, (CH3)2HSiOSiH(CH3)2, and (CH3)H2SiOSiH2(CH3) were measured in the gas phase over the temperature range 273–363 K, using the very low pressure reactor (VLPR) in a molecular flow system. The absolute rate constants were temperature independent and take the values (in , 2σ uncertainties): , and k3=(2.42±0.25)×10−10. All title reactions proceed
测量了氯原子与(CH 3)3 SiOSi(CH 3)3,(CH 3)2 HSiOSiH(CH 3)2和(CH 3)H 2 SiOSiH 2(CH 3)反应的绝对速率常数。使用分子流系统中的超低压反应器(VLPR),在273–363 K的温度范围内以气相形式存在。绝对速率常数与温度无关,取值(in ,2σ不确定度):,且k 3 =(2.42±0.25)×10 -10。所有标题反应都是通过C–H和/或Si–H氢的提取进行的,从而导致HCl的形成。结果表明,Si-H键对Cl原子攻击的反应性高于C-H键的反应性。