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1,3-二甲基二硅烷 | 14396-21-5

中文名称
1,3-二甲基二硅烷
中文别名
——
英文名称
bis(monomethylsilyl)ether
英文别名
1,3-dimethyldisiloxane;bis(methylsilyl) ether;bis(methylsilyl)ether;1,3-dimethyl-disiloxane;1,3-Dimethyl-disiloxan;dimethyl siloxane;methyl(methylsilyloxy)silane
1,3-二甲基二硅烷化学式
CAS
14396-21-5
化学式
C2H10OSi2
mdl
——
分子量
106.272
InChiKey
OFLMWACNYIOTNX-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 熔点:
    -138 °C
  • 沸点:
    34.5 °C
  • 密度:
    0.7487 g/cm3

计算性质

  • 辛醇/水分配系数(LogP):
    -0.73
  • 重原子数:
    5
  • 可旋转键数:
    2
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    9.2
  • 氢给体数:
    0
  • 氢受体数:
    1

安全信息

  • 海关编码:
    2934999090

SDS

SDS:b7a4db8ec9eda0ea8eeb5a5b8787f73c
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反应信息

  • 作为反应物:
    参考文献:
    名称:
    117.甲基二硅氧烷和1:1:1-二甲基二甲硅烷基与硼和卤化氢的反应
    摘要:
    DOI:
    10.1039/jr9580000604
  • 作为产物:
    描述:
    methyl iodosilane 作用下, 反应 0.33h, 以96%的产率得到1,3-二甲基二硅烷
    参考文献:
    名称:
    Drake, John E.; Glavincevski, Boris M.; Hemmings, Raymond T., Canadian Journal of Chemistry, 1980, vol. 58, # 20, p. 2161 - 2166
    摘要:
    DOI:
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文献信息

  • Kinetic study for the reactions of chlorine atoms with hexamethyldisiloxane, 1,1,3,3-tetramethyldisiloxane, and 1,3-dimethyldisiloxane
    作者:Alexandros V. Prosmitis、Vassilis C. Papadimitriou、Josef Pola、Panos Papagiannakopoulos
    DOI:10.1016/s0009-2614(01)00713-8
    日期:2001.8
    for the reactions of chlorine atoms with (CH3)3SiOSi(CH3)3, (CH3)2HSiOSiH(CH3)2, and (CH3)H2SiOSiH2(CH3) were measured in the gas phase over the temperature range 273–363 K, using the very low pressure reactor (VLPR) in a molecular flow system. The absolute rate constants were temperature independent and take the values (in , 2σ uncertainties): , and k3=(2.42±0.25)×10−10. All title reactions proceed
    测量了氯原子与(CH 3)3 SiOSi(CH 3)3,(CH 3)2 HSiOSiH(CH 3)2和(CH 3)H 2 SiOSiH 2(CH 3)反应的绝对速率常数。使用分子流系统中的超低压反应器(VLPR),在273–363 K的温度范围内以气相形式存在。绝对速率常数与温度无关,取值(in ,2σ不确定度):,且k 3 =(2.42±0.25)×10 -10。所有标题反应都是通过C–H和/或Si–H氢的提取进行的,从而导致HCl的形成。结果表明,Si-H键对Cl原子攻击的反应性高于C-H键的反应性。
  • Gmelin Handbuch der Anorganischen Chemie, Gmelin Handbook: B: B-Verb.9, 3.2.6, page 67 - 74
    作者:
    DOI:——
    日期:——
  • Some Derivatives of Monoiodomonomethylsilane
    作者:Harry Emel�us、Mario Onyszchuk、Wilhelm Kuchen
    DOI:10.1002/zaac.19562830109
    日期:1956.1
    AbstractMono‐ and di‐iodomonomethylsilane, CH3SiH2I and CH3SiHI2, have been prepared by the reaction of monomethylsilane with hydrogen iodide in the presence of aluminium iodide. The monoiodo compound reacts with water to form the siloxan, (CH3SiH2)2O, with mercuric sulphide to form the silthian, (CH3SiH2)2S, and with silver cyanide to form the isocyanide, CH3SiH2NC, all of which have been characterised. The isocyanide does not react with nickel carbonyl and rapidly polymerises in the presence of boron trifluoride.
  • Moore, Darren L.; Taylor, Mark P.; Timms, Peter L., Journal of the Chemical Society, Dalton Transactions, 2000, # 16, p. 2673 - 2678
    作者:Moore, Darren L.、Taylor, Mark P.、Timms, Peter L.
    DOI:——
    日期:——
  • Kinetics and mechanism of the reactions of oxygen atoms (3P) with silane, methylsilane, dimethylsilane, and trimethylsilane
    作者:O. Horie、R. Taege、B. Reimann、N. L. Arthur、P. Potzinger
    DOI:10.1021/j100164a042
    日期:1991.5
    The reactions of O(3P) atoms with the silanes Me(4-n)SiH(n) (n = 1-4) have been investigated at room temperature in a discharge flow system with mass spectrometric detection and also in stationary photolysis experiments. Analysis of the end products provided conclusive evidence that the only primary process occurring in each case was the abstraction of hydrogen from the Si-H bond by the O atom leading to the formation of the OH and silyl radicals. The values of the rate constants obtained are k/10(-13) cm3 s-1): k(O + SiH4) = 3.5, k(O + SiD4) = 1.4, k(O + MeSiH3) = 8.9; k(O + Me2SiH2) = 18.0 k(O + Me3SiH) = 30.6, and k(O + Me3SiD) = 16.0. The marked increase in rate constant with methylation is unexpected in view of the known similarity of the Si-H bond dissociation energy in SiH4 and the methylsilanes. A possible explanation is offered in terms of a reaction model involving partial charge transfer from Si to the attacking O, followed by proton transfer.
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