Organometallic compound, its synthesis method, and solution raw material and metal-containing thin film containing the same
申请人:MITSUBISHI MATERIALS CORPORATION
公开号:US20040210071A1
公开(公告)日:2004-10-21
The organometallic compound of the present invention is a compound that has bonds between metal atoms and nitrogen atoms or bonds between semimetal atoms and nitrogen atoms, and the content of chlorine in the compound is 200 ppm or less and the content of water is 30 ppm or less. In addition, the general formula of this compound is represented by the following formula (1):
M
[(
R
1
)
2
N
]
(n−s)
(
R
2
)
s
(1)
wherein, M represents a metal atom or semimetal atom, with the metal atom being Hf, Zr, Ta, Ti, Ce, Al, V, La, Nb or Ni, and the semimetal atom being Si, R
1
represents a methyl group or ethyl group, R
2
represents an ethyl group, n represents the valence of M, and s represents an integer of 0 to n−1.
本发明的有机金属化合物是一种具有金属原子与氮原子之间的键或半金属原子与氮原子之间的键的化合物,该化合物中氯的含量为200 ppm或更低,水的含量为30 ppm或更低。此化合物的一般式由以下式(1)表示:M[(R1)2N](n−s)(R2)s(1)其中,M代表金属原子或半金属原子,金属原子为Hf、Zr、Ta、Ti、Ce、Al、V、La、Nb或Ni,半金属原子为Si,R1代表甲基基团或乙基基团,R2代表乙基基团,n代表M的化合价,s代表0到n-1之间的整数。