Conventional solid-phase oligonucleotide synthesis overcomes the reversibility of acid-dependent detritylation by washing away the released dimethoxytrityl cations (DMT+) with acid. This option is unavailable if the acid is photogenerated in an overlying solid film, as in the photolithographic fabrication of oligonucleotide arrays on planar surfaces. To overcome the resulting reversibility problem we developed methods of achieving ≥98% detritylation of glass-attached 5′-O-DMT-thymidine, a model for 5′-O-DMT-protected oligonucleotides, by the photogeneration of trichloroacetic acid in a solid film. Enhanced intrafilm diffusion, insufficient to degrade the photolithographic resolution but enabling DMT+ to move from its plane of release into the overlying photoacid-generating film, increased detritylation from ≤30% to ≥98%. Inclusion of an intrafilm carbocation scavenger such as a triarylsilane hydride converted the detritylation into a time-dependent irreversible process proceeding to ≥99% detritylation within 60 s following brief photoacid generation. Light sensitivity is high, exceeding direct photodeprotection methods by 15–100 fold.
传统的固相寡核苷酸合成方法是用酸洗掉释放出的二甲氧基三苯甲基阳离子(
DMT+),从而克服了酸依赖性脱苯作用的可逆性。如果酸是在上覆固体薄膜中光照生成的,就无法使用这种方法,例如在平面上光刻制造寡核苷酸阵列。为了克服由此产生的可逆性问题,我们开发了一种方法,通过在固体薄膜中光生成
三氯乙酸,实现
玻璃附着的 5′-O-
DMT 胸苷(5′-O-
DMT 保护寡核苷酸的模型)≥98% 的脱苯甲基化。膜内扩散的增强不足以降低光刻分辨率,但却能使
DMT+ 从其释放平面移动到上覆的光酸生成膜中,从而将脱盐率从≤30%提高到≥98%。加入膜内碳位清除剂(如三芳基
硅烷氢化物)后,在短暂的光酸生成后 60 秒内,脱苯甲酰化转化为与时间相关的不可逆过程,脱苯甲酰化率≥99%。光敏感性很高,比直接光防护方法高出 15-100 倍。