1-Butylnaphthalene-2,6-diol

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 1-Butylnaphthalene-2,6-diol
• 英文别名: 1-butylnaphthalene-2,6-diol
• 化学式: C₁₄H₁₆O₂
• 分子量: 216.27
• InChiKey: MTVXTSUMKQYDAV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.3
• 重原子数：
  16
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.29
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

文献信息

• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20160145231A1

  公开（公告）日：2016-05-26

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。
• RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYPHENOL COMPOUND USED THEREIN, AND ALCOHOL COMPOUND CAPABLE OF BEING DERIVED THEREFROM
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP2743769A1

  公开（公告）日：2014-06-18

  The present invention provides a resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom. wherein R1 are each independently a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms wherein the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a heteroatom, or an aromatic group having 6 to 30 carbon atoms; R2 are each independently a hydrogen atom, a halogen atom, a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group and may be the same or different on the same naphthalene ring; at least one of R2 is a hydroxyl group; n is an integer of 1 to 4; the structural formulas of the repeating units in the formulas (1) and (2) may be the same or different; in the general formula (1), m1 are each independently an integer of 1 to 7; and in the general formula (2), X are each independently an oxygen atom or a sulfur atom, and m2 are each independently an integer of 1 to 6.

  本发明提供了一种含有通式（1）或（2）所代表的化合物的抗蚀剂组合物、一种使用该组合物形成抗蚀剂图案的方法、一种用于该组合物的多酚化合物，以及一种可从该组合物中提取的醇类化合物。 其中 R1 各自独立地为单键或具有 1 至 30 个碳原子的 2n 价烃基，其中烃基可以是环烃基、双键、杂原子或具有 6 至 30 个碳原子的芳香基；R2 各自独立地为氢原子、卤素原子、具有 1 至 10 个碳原子的直链、支链或环状烷基、具有 6 至 10 个碳原子的芳基、具有 2 至 10 个碳原子的烯基或羟基，在同一萘环上可以相同或不同；R2中至少有一个是羟基； n是1至4的整数；式（1）和式（2）中重复单元的结构式可以相同或不同；通式（1）中，m1各自独立地是1至7的整数；通式（2）中，X各自独立地是氧原子或硫原子，m2各自独立地是1至6的整数。
• ALCOHOLIC COMPOUND AND METHOD FOR PRODUCING ALCOHOLIC COMPOUND
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：EP3051350A2

  公开（公告）日：2016-08-03

  The present invention provides an alcoholic compound represented by the general formula (6) or (7), and a method for producing an alcoholic compound represented by the general formula (6) or (7): wherein X' is a hydrogen atom or a monovalent substituent having 1 to 18 carbon atoms; R0 are each independently an alkyl group having 1 to 4 carbon atoms or a halogen atom and may be the same or different on the same naphthalene ring; R' are each independently an alkylene group having 1 to 4 carbon atoms; q are each independently an integer of 1 or larger; and p are each independently an integer of 0 to 5.

  本发明提供一种由通式（6）或（7）代表的醇类化合物，以及一种生产由通式（6）或（7）代表的醇类化合物的方法： 其中，X'是氢原子或具有 1 至 18 个碳原子的单价取代基；R0 各自独立地是具有 1 至 4 个碳原子的烷基或卤素原子，且在同一萘环上可以相同或不同；R'各自独立地是具有 1 至 4 个碳原子的亚烷基；q 各自独立地是 1 或更大的整数；p 各自独立地是 0 至 5 的整数。
• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHENOL COMPOUND USED THEREIN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：EP3279190B1

  公开（公告）日：2020-08-12
• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
  申请人：Echigo Masatoshi

  公开号：US20140248561A1

  公开（公告）日：2014-09-04

  A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.