4-[(5,5-Dioxo-4,8-dioxa-5lambda6-thiatricyclo[4.2.1.03,7]nonan-2-yl)oxycarbonyl]cyclohexane-1-sulfonic acid

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 氧硫杂环戊烷
• 英文名称: 4-[(5,5-Dioxo-4,8-dioxa-5lambda6-thiatricyclo[4.2.1.03,7]nonan-2-yl)oxycarbonyl]cyclohexane-1-sulfonic acid
• 英文别名: 4-[(5,5-dioxo-4,8-dioxa-5λ6-thiatricyclo[4.2.1.03,7]nonan-2-yl)oxycarbonyl]cyclohexane-1-sulfonic acid
• 化学式: C₁₃H₁₈O₉S₂
• 分子量: 382.4
• InChiKey: DFFGHJXEFVERGV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.5
• 重原子数：
  24
• 可旋转键数：
  4
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.92
• 拓扑面积：
  150
• 氢给体数：
  1
• 氢受体数：
  9

文献信息

• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND COMPOUND
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US20140178821A1

  公开（公告）日：2014-06-26

  A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a photo-decomposable quencher (D0) containing a compound represented by general formula (d0) shown below. In the formula, R 1 represents a hydrocarbon group of 4 to 20 carbon atoms which may have a substituent; Y 1 represents a single bond or a divalent linking group; R 2 and R 3 each independently represents a substituent of 0 to 20 carbon atoms other than a fluorine atom; one of R 2 and R 3 may form a ring with Y 1 ; M m+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.
• US9040224B2
  申请人：——

  公开号：US9040224B2

  公开（公告）日：2015-05-26