1,2,4,5-Tetrafluoro-3,6-dimethylcyclohexane

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: 1,2,4,5-Tetrafluoro-3,6-dimethylcyclohexane
• 英文别名: 1,2,4,5-tetrafluoro-3,6-dimethylcyclohexane
• 化学式: C₈H₁₂F₄
• 分子量: 184.17
• InChiKey: KTFVWDGUZOLQFX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  12
• 可旋转键数：
  0
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES
  申请人：Universal Display Corporation

  公开号：US20160260913A1

  公开（公告）日：2016-09-08

  Novel ligands for metal complexes, where the ligands contain fused carbo or heterocycles on the quinoline building block are disclosed. More extended aromaticity within the molecule allows red shift when the molecules are used as light emitting dopants in organic light emitting diodes/devices.

  金属配合物的新配体中，配体含有在喹啉构建块上融合的碳框架或杂环。分子内更广泛的芳香性使得这些分子在有机发光二极管/器件中用作发光掺杂剂时发生红移。
• Organic Electroluminescent Materials and Devices
  申请人：Universal Display Corporation

  公开号：US20160218294A1

  公开（公告）日：2016-07-28

  This invention discloses novel light-emitting materials. These materials comprise a side chain which contains at least two Si or Ge atoms, such as bis(trimethylsilyl)methyl, or a side chain that includes Si—F bond, or a side chain that includes a fluorine-containing alkyl chain. This new side chain could fine tune emission color, reduce the stacking of the light-emitting materials, maintain good lifetime, and result in high PLQY.
• US9711730B2
  申请人：——

  公开号：US9711730B2

  公开（公告）日：2017-07-18
• [EN] METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE<br/>[FR] PROCÉDÉ DE FORMATION D'UN MOTIF, COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU AUX RADIATIONS, FILM SENSIBLE AUX RAYONS ACTINIQUES OU AUX RADIATIONS, PROCESSUS DE FABRICATION D'UN DISPOSITIF ÉLECTRONIQUE ET DISPOSITIF ÉLECTRONIQUE
  申请人：FUJIFILM CORP

  公开号：WO2014142360A1

  公开（公告）日：2014-09-18

  According to one embodiment, a method of forming a pattern includes (a) forming a film of an actinic-ray- or radiation-sensitive resin composition, (b) exposing the film to light, and (c) developing the exposed film with a developer comprising an organic solvent to thereby form a negative pattern. The actinic-ray- or radiation-sensitive resin composition includes (A) a resin whose solubility in the developer comprising an organic solvent is lowered when acted on by an acid, which resin contains a repeating unit with any of lactone structures of general formula (1) below, and (B) a compound that when exposed to actinic rays or radiation, generates an acid.