perfluorocyclohexanesulfonic acid | 2106-55-0

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: perfluorocyclohexanesulfonic acid
• 英文别名: Perfluorocyclohexane sulfonic acid；1,2,2,3,3,4,4,5,5,6,6-undecafluorocyclohexane-1-sulfonic acid
• CAS: 2106-55-0
• 化学式: C₆HF₁₁O₃S
• 分子量: 362.121
• InChiKey: VFOJXEHRTNGBDB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  21
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  62.8
• 氢给体数：
  1
• 氢受体数：
  14

反应信息

• 作为反应物：
  描述：

  perfluorocyclohexanesulfonic acid 、 potassium hydroxide 生成 potassium perfluorocyclohexanesulfonate
  参考文献：
  名称：

  Gmelin Handbuch der Anorganischen Chemie, Gmelin Handbook: F: PerFHalOrg.2, 1.3.1, page 76 - 99

  摘要：

  DOI：
• 作为产物：
  描述：

  1,2,2,3,3,4,4,5,5,6,6-十一氟环己烷-1-磺酰氟 在 氢氧化钾 、 硫酸 作用下， 生成 perfluorocyclohexanesulfonic acid
  参考文献：
  名称：

  cafiicfzsojk

  摘要：

  公开号：

  US02732398A1

文献信息

• Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
  申请人：FUJIFILM CORPORATION

  公开号：US10248019B2

  公开（公告）日：2019-04-02

  A pattern forming, method, includes: (i) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition that contains (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and decomposing by an action of an acid to decrease a solubility of the compound (A) for an organic solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.

  一种形成图案的方法包括：(i) 使用一种含有（A）一种能够在受到光或辐射照射时生成酸并通过酸的作用分解以降低该化合物（A）对有机溶剂的溶解度的光敏或辐射敏感树脂组合物形成薄膜；(ii) 曝光薄膜；和(iii) 使用含有有机溶剂的显影剂进行显影。
• PROCESS FOR PRODUCING AMINOALKYLSULFONIC ACID AND METHOD OF SALT EXCHANGE FOR SALT THEREOF
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：EP1548002A1

  公开（公告）日：2005-06-29

  The present invention relates to a method for efficiently producing an aminoalkylsulfonic acid in an industrial scale, and provides    "a process for producing an aminoalkylsulfonic acid represented by the general formula [2]:    wherein R1 and R2 are each independently a hydrogen atom, an alkyl group, an aryl group or an aralkyl group; and R3 and R4 are each independently a hydrogen atom or an alkyl group, comprising reacting an aminoalkylsulfonate salt represented by the general formula [1]:    wherein M is an alkali metal atom, an organic ammonium ion or an ammonium ion; and R1 to R4 are the same as described above,    an aqueous solution thereof, or a solution dissolving any one of them in a water-soluble organic solvent, selected from alcohols having 1 to 3 carbon atoms, carboxylic acids having 2 to 12 carbon atoms and dimethylformamide, with an organic acid; and    a method of salt exchange for an aminoalkylsulfonate salt represented by the general formula [1']:    wherein M' is an alkali metal atom, an organic ammonium ion or an ammonium ion; and R1 and R4 are the same as described above, comprising reacting an aminoalkylsulfonate salt represented by the above general formula [2] with a hydroxide represented by the general formula [6]:         M'OH     [6]    wherein M' is the same as described above, in an alcohol or water".

  本发明涉及一种在工业规模上高效生产氨基磺酸的方法，并提供“一种生产由通式[2]表示的氨基磺酸的方法：其中R1和R2分别是氢原子、烷基、芳基或芳基烷基；R3和R4分别是氢原子或烷基的氨基磺酸盐发生反应所得的方法，通式[1]表示如下：其中M是碱金属原子、有机铵离子或铵离子；R1至R4与上述相同，其水溶液或将任何一种溶解于水溶性有机溶剂中的溶液，所选的有1至3个碳原子的醇、有2至12个碳原子的羧酸和二甲基甲酰胺，与有机酸反应；以及氨基磺酸盐交换的方法，通式[1']表示如下：其中M'是碱金属原子、有机铵离子或铵离子；R1和R4与上述相同，包括将上述通式[2]表示的氨基磺酸盐与通式[6]表示的氢氧化物发生反应：M'OH [6]其中M'与上述相同，在醇或水中”。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND
  申请人：FUJIFILM Corporation

  公开号：US20160280621A1

  公开（公告）日：2016-09-29

  The composition contains an alkali-soluble resin and a crosslinking agent that is represented by the following General Formula (I). In the formula, each of R 1 and R 6 independently represents a hydrogen atom or a hydrocarbon group having 5 or less carbon atoms; each of R 2 and R 5 independently represents an alkyl group, a cycloalkyl group, an aryl group, or an acyl group; and each of R 3 and R 4 independently represents a hydrogen atom or an organic group having 2 or more carbon atoms, and R 3 and R 4 may be bonded to each other to form a ring.

  该组合物包含一种碱溶性树脂和一种由下列通式（I）表示的交联剂。在该式中，R1和R6各自独立地表示氢原子或具有5个或更少碳原子的碳氢基团；R2和R5各自独立地表示烷基、环烷基、芳基或酰基；R3和R4各自独立地表示氢原子或具有2个或更多碳原子的有机基团，且R3和R4可以结合形成环。
• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND
  申请人：FUJIFILM CORPORATION

  公开号：US20160070167A1

  公开（公告）日：2016-03-10

  There is provided a pattern forming method comprising (i) a step of forming a film containing an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the specific formula, (B) a compound different from the compound (A) and capable of generating an acid upon irradiation with an actinic ray or radiation, and (P) a resin that does not react with the acid generated from the compound (A) and is capable of decreasing the solubility for an organic solvent-containing developer by the action of the acid generated from the compound (B), (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern; the actinic ray-sensitive or radiation-sensitive resin composition above; a resist film using the composition.

  提供了一种图案形成方法，包括（i）形成一种薄膜，其中包含一种感光树脂组成物，该组成物包含（A）一种特定化学式代表的化合物，（B）一种不同于化合物（A）的化合物，在接受光辐射后能够产生酸，并且（P）一种树脂，该树脂不会与从化合物（A）产生的酸发生反应，并且能够通过来自化合物（B）产生的酸的作用降低有机溶剂含有的显影剂的溶解度，（ii）曝光薄膜，（iii）使用有机溶剂含有的显影剂对曝光后的薄膜进行显影，形成负图案；上述感光树脂组成物；使用该组成物的抗蚀膜。
• COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20160024005A1

  公开（公告）日：2016-01-28

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by the following formula (1) or (2), and the formula (1) and (2) are defined as herein, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method comprising a step of exposing the resist film, and a step of developing the exposed film, and a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.

  提供了一种包含下列式子（1）或（2）所代表的化合物的光致射线敏感或辐射敏感的树脂组合物，其中式（1）和（2）的定义如本文所述，以及包括该光致射线敏感或辐射敏感的树脂组合物的光阻膜，以及包括曝光光阻膜的步骤和显影曝光膜的步骤的图案形成方法，以及包括图案形成方法的制造电子装置的方法，以及由电子装置的制造方法制造的电子装置。