1-(4-n-butoxynaphthalen-1-yl)tetrahydrothiophenium nonafluoro-n-butanesulfonate | 209482-18-8

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 卤代烷
• 英文名称: 1-(4-n-butoxynaphthalen-1-yl)tetrahydrothiophenium nonafluoro-n-butanesulfonate
• 英文别名: 1-(4-Butoxynaphthyl)tetrahydrothiophenium perfluorobutanesulfonate；1-(4-butoxynaphthalen-1-yl)thiolan-1-ium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate
• CAS: 209482-18-8
• 化学式: C₄F₉O₃S*C₁₈H₂₃OS
• 分子量: 586.54
• InChiKey: WNDABSCBNOUSTE-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  6.75
• 重原子数：
  37
• 可旋转键数：
  7
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.55
• 拓扑面积：
  75.8
• 氢给体数：
  0
• 氢受体数：
  13

文献信息

• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, COMPOUND, AND POLYMER
  申请人：ASANO Yuusuke

  公开号：US20120156612A1

  公开（公告）日：2012-06-21

  A radiation-sensitive resin composition includes a first polymer that includes a repeating unit having an acid-labile group and becomes alkali-soluble upon dissociation of the acid-labile group, and a radiation-sensitive acid-generating agent. The acid-labile group has a structure shown by a general formula (1). R 1 represents a methyl group or the like, R 2 represents a hydrocarbon group that forms a cyclic structure, R 3 represents a fluorine atom or the like, R 4 represents a carbon atom, and n 1 is an integer from 1 to 7.

  一种辐射敏感树脂组合物包括第一聚合物，其中包括具有酸敏感基团的重复单元，在酸敏感基团解离后变为碱溶解性，并且包括辐射敏感酸发生剂。酸敏感基团具有通式（1）所示的结构。R1代表甲基基团或类似物，R2代表形成环状结构的碳氢基团，R3代表氟原子或类似物，R4代表碳原子，n1为1至7之间的整数。
• PHOTORESIST COMPOSITION, RESIST-PATTERN FORMING METHOD, POLYMER, AND COMPOUND
  申请人：SATO Mitsuo

  公开号：US20120258402A1

  公开（公告）日：2012-10-11

  A photoresist composition includes a polymer that includes a structural unit shown by the following formula (1), and a photoacid generator. R 1 in the formula (1) represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group, Z represents a group that forms a divalent alicyclic group having 3 to 20 carbon atoms together with a carbon atom bonded to X, X represents an alkanediyl group having 1 to 6 carbon atoms, Y represents a hydrogen atom or —CR 2 R 3 (OR 4 ), and R 2 to R 4 independently represent a hydrogen atom or a monovalent hydrocarbon group, provided that R 3 and R 4 optionally bond to each other to form a cyclic ether structure together with a carbon atom bonded to R 3 and an oxygen atom bonded to R 4 .

  一种光阻剂组合物包括一个聚合物，该聚合物包括下式（1）所示的结构单元，以及一个光酸发生剂。在式（1）中，R1代表氢原子、氟原子、甲基基团或三氟甲基基团，Z代表与与X键合的碳原子一起形成具有3到20个碳原子的二价脂环族基团，X代表具有1到6个碳原子的脂肪二基基团，Y代表氢原子或—CR2R3(OR4)，R2到R4独立地代表氢原子或一价烃基团，其中R3和R4可选择地相互键合以与与R3键合的碳原子和与R4键合的氧原子一起形成环状醚结构。
• PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION
  申请人：JSR CORPORATION

  公开号：US20210181627A1

  公开（公告）日：2021-06-17

  A pattern-forming method includes: applying directly or indirectly on a substrate a radiation-sensitive composition containing a complex and an organic solvent to form a film; exposing the film to an ultraviolet ray, a far ultraviolet ray, an extreme ultraviolet ray, or an electron beam; and developing the film exposed, wherein the complex is represented by formula (1). [M m L n Q p ]  (1) In the formula (1), M represents a zinc atom, a cobalt atom, a nickel atom, a hafnium atom, a zirconium atom, a titanium atom, an iron atom, a chromium atom, a manganese atom, or an indium atom; and L represents a ligand derived from a compound represented by formula (2). R 1 —CHR 3 —R 2 (2) In the formula (2), R 1 and R 2 each independently represent —C(═O)—R A , —C(═O)—OR B , or —CN.

  一种图案形成方法包括：在基板上直接或间接地涂覆含有复合物和有机溶剂的辐射敏感组合物以形成膜；将膜暴露于紫外线、远紫外线、极紫外线或电子束；和显影所暴露的膜，其中该复合物由式（1）表示。[MmLnQp] (1)在式（1）中，M代表锌原子、钴原子、镍原子、铪原子、锆原子、钛原子、铁原子、铬原子、锰原子或铟原子；L代表来自由式（2）表示的化合物的配体。R1—CHR3—R2(2)在式（2）中，R1和R2分别独立地表示—C(═O)—RA、—C(═O)—ORB或—CN。
• RADIATION-SENSITIVE RESIN COMPOSITION, MONOMER, POLYMER, AND PRODUCTION METHOD OF RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：MARUYAMA Ken

  公开号：US20120237876A1

  公开（公告）日：2012-09-20

  A radiation-sensitive resin composition includes a solvent and a polymer. The polymer includes a repeating unit represented by a formula (I), a repeating unit represented by a formula (II), or a both thereof. Each of R 1 to R 3 independently represents a hydroxyl group, or the like. At least one of R 1 represents a group having two or more heteroatoms. l is an integer from 1 to 5. Each of m and n is independently an integer from 0 to 5. Each of R 7 and R 11 independently represents a hydrogen atom, or the like. Each of R 8 to R 10 independently represents a hydrogen atom, or the like. A represents —O—, or the like. D represents a substituted or unsubstituted methylene group, or the like.

  一种辐射敏感树脂组合物包括溶剂和聚合物。该聚合物包括由式(I)表示的重复单元，由式(II)表示的重复单元，或两者兼有。R1至R3中的每一个独立地表示一个羟基或类似物。其中至少一个R1表示具有两个或更多杂原子的基团。l是从1到5的整数。m和n中的每一个独立地是从0到5的整数。R7和R11中的每一个独立地表示氢原子或类似物。R8到R10中的每一个独立地表示氢原子或类似物。A表示—O—或类似物。D表示取代或未取代的亚甲基基团或类似物。
• COMPOSITION FOR FILM FORMATION, FILM, RESIST UNDERLAYER FILM-FORMING METHOD, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND
  申请人：JSR CORPORATION

  公开号：US20190094695A1

  公开（公告）日：2019-03-28

  The composition for film formation includes a compound including a group of the formula (1) and a solvent. In the formula (1), R 1 to R 4 each independently represent a hydrogen atom, a monovalent organic group having 1 to 20 carbon atoms, or R 1 to R 4 taken together represent a cyclic structure having 3 to 20 ring atoms together with the carbon atom or a carbon chain to which R 1 to R 4 bond. Ar 1 represents a group obtained by removing (n+3) hydrogen atoms from an aromatic ring of an arene having 6 to 20 carbon atoms. n is an integer of 0 to 9. R 5 represents a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms.

  影片形成的组合物包括一个化合物，其中包括一个公式（1）的基团和一个溶剂。在公式（1）中，R1至R4分别代表氢原子，具有1至20个碳原子的一价有机基团，或者R1至R4一起代表具有3至20个环原子的环结构，该环结构与碳原子或R1至R4键合的碳链一起。Ar1代表通过从具有6至20个碳原子的芳香环中去除（n+3）个氢原子而获得的基团。n为0至9之间的整数。R5代表一个羟基，一个卤素原子，一个硝基，或者具有1至20个碳原子的一价有机基团。