申请人:Kawamura Koichi
公开号:US20090092766A1
公开(公告)日:2009-04-09
The invention provides a graft pattern forming method including contacting a radical-polymerizable unsaturated compound with a surface of a base material capable of generating radicals by exposure; and exposing imagewise with laser light having a wavelength of 360 to 700 nm to form a graft polymer directly bonded to the base material patternwise on the surface of the base material. The invention also provides a conductive pattern forming method including imparting conductivity to the graft pattern formed patternwise obtained by the graft pattern forming method.