申请人:Clariant International Ltd.
公开号:EP1033624A1
公开(公告)日:2000-09-06
A chemically amplified radiation sensitive composition is provided which comprises a film forming hydroxystyrene based resin in combination with an onium salt precursor which generates a fluorinated alkanesulfonic acid as a photoacid generator. This composition can realize neither corrosion of apparatuses by outgas, nor T-shaped pattern profiles, nor change in linewidth attributable to process time delay, on the other side, high sensitivity and resolution, and good pattern profiles and stability thereof.
本发明提供了一种化学放大辐射敏感组合物,该组合物由成膜的羟基苯乙烯基树脂与鎓盐前体结合而成,鎓盐前体生成氟化烷磺酸作为光酸发生器。这种组合物既不会因放出气体而腐蚀设备,也不会产生 T 型图案轮廓,也不会因加工时间延迟而改变线宽,同时还具有高灵敏度和高分辨率,以及良好的图案轮廓和稳定性。