5-[(Cyclohexylcarbonyl)oxy]-1-naphthyl cyclohexanecarboxylate

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 5-[(Cyclohexylcarbonyl)oxy]-1-naphthyl cyclohexanecarboxylate
• 英文别名: [5-(cyclohexanecarbonyloxy)naphthalen-1-yl] cyclohexanecarboxylate
• 化学式: C₂₄H₂₈O₄
• 分子量: 380.5
• InChiKey: WNRAHQXFQPMNEY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.8
• 重原子数：
  28
• 可旋转键数：
  6
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• COMPOSITION FOR FORMING BASE FILM FOR LITHOGRAPHY AND METHOD FOR FORMING MULTILAYER RESIST PATTERN
  申请人：Oguro Dai

  公开号：US20100316950A1

  公开（公告）日：2010-12-16

  A composition for forming an underlayer film for lithography for imparting excellent optical characteristics and etching resistance to an underlayer film for lithography, an underlayer film being formed of the composition and having a high refractive index (n) and a low extinction coefficient (k), being transparent, having high etching resistance, containing a significantly small amount of a sublimable component, and a method for forming a pattern using the underlayer film are provided. The composition for forming an underlayer film contains a naphthalene formaldehyde polymer having a specific unit obtained by reacting naphthalene and/or alkylnaphthalene with formaldehyde, and an organic solvent.