摩熵化学
数据库官网
小程序
打开微信扫一扫
首页 分子通 化学资讯 化学百科 反应查询 关于我们
请输入关键词

二[2-[N-乙基(十七氟辛烷磺酰基)氨基]乙基]磷酸氢酯 | 2965-52-8

中文名称
二[2-[N-乙基(十七氟辛烷磺酰基)氨基]乙基]磷酸氢酯
中文别名
——
英文名称
1-Octanesulfonamide, N,N'-[phosphinicobis(oxy-2,1-ethanediyl)]bis[N-ethyl-1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-heptadecafluoro-
英文别名
bis[2-[ethyl(1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-heptadecafluorooctylsulfonyl)amino]ethyl] hydrogen phosphate
二[2-[N-乙基(十七氟辛烷磺酰基)氨基]乙基]磷酸氢酯化学式
CAS
2965-52-8
化学式
C24H19F34N2O8PS2
mdl
——
分子量
1204.5
InChiKey
BZZAKKWGRKFWJJ-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 熔点:
    173 - 176°C
  • 沸点:
    580.3±60.0 °C(Predicted)
  • 密度:
    1.716±0.06 g/cm3(Predicted)
  • 溶解度:
    可溶于丙酮(少许)、甲醇(少许)

计算性质

  • 辛醇/水分配系数(LogP):
    10.1
  • 重原子数:
    71
  • 可旋转键数:
    26
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    147
  • 氢给体数:
    1
  • 氢受体数:
    44

文献信息

  • NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, DISPLAY DEVICE PROVIDED WITH ELEMENT, AND ORGANIC EL DISPLAY
    申请人:TORAY INDUSTRIES, INC.
    公开号:US20190302617A1
    公开(公告)日:2019-10-03
    The present invention provides a negative photosensitive resin composition that has high pigment dispersibility and stability and can reduce residues of unexposed portions during development. The present invention provides a negative photosensitive resin composition containing an (A) alkali-soluble resin, a (B) dispersant having an amine value exceeding 0, a (C) benzofuranone based organic pigment having an amide structure, a (D) radical polymerizable compound, and a (E) photoinitiator. In this negative photosensitive resin composition, the (A) alkali-soluble resin contains one or more selected from the group consisting of a (A1) polyimide, a (A2) polyimide precursor, a (A3) polybenzoxazole, and a (A4) polybenzoxazole precursor, and the (B) dispersant having an amine value exceeding 0 contains a (B1) dispersant including a repeating unit represented by general formula (2) and a repeating unit represented by general formula (3) and a (B2) dispersant that is an acrylic block copolymer having an amine value of 15 to 60 mgKOH/g and/or a (B3) dispersant having a urethane bond. (In general formula (2), R 1 represents an alkylene group. R 2 and R 3 , which may be the same or different, each represents hydrogen, an alkyl group or a hydroxyl group. x represents an integer of 0 to 20. However, when x is 0, at least one of R 2 and R 3 is an alkyl group. m represents an integer of 1 to 100. In general formula (3), n represents an integer of 1 to 100.)
    本发明提供了一种具有高颜料分散性和稳定性的负性感光树脂组合物,可以减少在显影过程中未曝光部分的残留物。本发明提供了一种包含(A)可溶于碱性树脂、(B)胺值超过0的分散剂、(C)苯并呋喃酮基有机颜料(具有酰胺结构)、(D)自由基聚合化合物和(E)光引发剂的负性感光树脂组合物。在这种负性感光树脂组合物中,(A)可溶于碱性树脂包含从以下组中选择的一种或多种:(A1)聚酰亚胺、(A2)聚酰亚胺前体、(A3)聚苯并噁唑和(A4)聚苯并噁唑前体;而具有胺值超过0的(B)分散剂包括具有由通用公式(2)表示的重复单元和由通用公式(3)表示的重复单元的(B1)分散剂,以及胺值为15至60 mgKOH/g的丙烯酸酯嵌段共聚物(B2)和/或具有脲键的(B3)分散剂。(在通用公式(2)中,R1表示烷基基团。R2和R3,可能相同也可能不同,每个表示氢、烷基基团或羟基。x表示0到20的整数。但是,当x为0时,R2和R3中至少有一个是烷基基团。m表示1到100的整数。在通用公式(3)中,n表示1到100的整数。)
  • Composition for film formation and material for insulating film formation
    申请人:JSR CORPORATION
    公开号:US20020172652A1
    公开(公告)日:2002-11-21
    A composition for film formation capable of forming a coating film excellent in low dielectric constant characteristics, cracking resistance, modulus of elasticity, and adhesion to substrates and useful as an interlayer insulating film material in semiconductor devices, etc. The composition for film formation contains (A) at least one member selected from an aromatic polyarylene and an aromatic poly (arylene ether), (B) a polyvinylsiloxane, and (C) an organic solvent.
    一种用于制备薄膜的组合物,能够形成具有低介电常数特性、抗开裂性、弹性模量和对基底的附着力优异的涂层膜,并可用作半导体器件中的层间绝缘膜材料等。该制膜组合物包含(A)至少一种选自芳香族聚芳烃和芳香族聚(芳烃醚)的成员,(B)聚乙烯基硅氧烷和(C)有机溶剂。
  • FIELD EFFECT TRANSISTOR
    申请人:TORAY INDUSTRIES, INC.
    公开号:US20160035457A1
    公开(公告)日:2016-02-04
    There is provided a field effect transistor which comprises a gate insulating layer, a gate electrode, a semiconductor layer, a source electrode and a drain electrode. The gate insulating layer contains an organic compound that contains a silicon-carbon bond and a metal compound that contains a bond between a metal atom and an oxygen atom; and the metal atoms are contained in the gate insulating layer in an amount of 10 to 180 parts by weight with respect to 100 parts by weight of the total of carbon atoms and silicon atoms. This field effect transistor (FET) has high mobility and a low voltage of the threshold value, while being suppressed in leak current.
    提供了一种场效应晶体管,包括栅绝缘层、栅电极、半导体层、源极电极和漏极电极。栅绝缘层包含一种含有硅碳键的有机化合物和一种含有金属原子和氧原子之间键的金属化合物;金属原子在栅绝缘层中的含量为100份碳原子和硅原子的总重量中的10至180份重量。该场效应晶体管具有高迁移率和低阈值电压,同时抑制泄漏电流。
  • Method for treating metallic or ceramic surfaces at high temperatures
    申请人:TEIJIN LIMITED
    公开号:EP0102240A2
    公开(公告)日:1984-03-07
    A novel method is provided for treating metallic or ceramic surfaces (hot plates, metallic molds and the likel at a high temperature of 200°C or above, wherein organic treating agents (finishes, release agents and the like) will not form a tar or sludge. According to this method, the continuous operation can be conducted due to neither stanining on the metallic surfaces nor stop of the machine for a heater cleaning. Examples of the organic treating agents to be used include a polyalkylene glycol thermally decomposable at 150°C or above in air and a fluorine-containing compound, preferably the nonionic type, having a fluoroalkyl group in the molecule.
    本发明提供了一种在 200°C 或以上高温下处理金属或陶瓷表面(热板、金属模具等)的新方法,其中有机处理剂(整理剂、脱模剂等)不会形成焦油或污泥。根据这种方法,既不会在金属表面形成污垢,也不会因清洗加热器而停机,因此可以进行连续操作。可使用的有机处理剂包括可在 150°C 或更高温度下在空气中热分解的聚亚烷基二醇,以及分子中含有氟烷基的含氟化合物(最好是非离子型)。
  • Composition for film formation, method of film formation, and silica-based film
    申请人:JSR Corporation
    公开号:EP1127929A2
    公开(公告)日:2001-08-29
    A composition for film formation which is capable of giving a silica-based coating film having an exceeding low dielectric constant and improved mechanical strength and useful as an interlayer insulating film in semiconductor devices and the like, a process for producing the composition, and a silica-based film obtained from the composition. The composition comprises (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing one or more silane compounds, and (B) an organic solvent.
    一种用于成膜的组合物,该组合物能够生成具有超低介电常数和更高机械强度的硅基涂膜,并可用作半导体器件等的层间绝缘膜;一种生产该组合物的工艺;以及一种由该组合物生成的硅基涂膜。该组合物包括 (A) 通过水解和缩合一种或多种硅烷化合物而得到的水解和缩合产物,以及 (B) 有机溶剂。
查看更多