COMPOUND, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PATTERN FORMING METHOD
申请人:MITSUBISHI GAS CHEMICAL COMPANY, INC.
公开号:US20150376202A1
公开(公告)日:2015-12-31
The material for forming an underlayer film for lithography of the present invention contains a compound having a structure represented by the following general formula (1).
(in formula (1), each X independently represents an oxygen atom or a sulfur atom, R
1
represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom or an aromatic group having 6 to 30 carbon atoms, R
2
represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, m is an integer of 0 to 3, n is an integer of 1 to 4, p is 0 or 1, and q is an integer of 1 to 100.)
本发明的光刻下层膜材料包含具有以下一般式(1)所代表结构的化合物。(在式(1)中,每个X独立地代表氧原子或硫原子,R1代表一个单键或具有1至30个碳原子的2n-价碳氢基团,碳氢基团可能具有一个环状碳氢基团,一个双键,一个杂原子或具有6至30个碳原子的芳香族基团,R2代表具有1至10个碳原子的直链、支链或环状烷基基团,具有6至10个碳原子的芳基基团,具有2至10个碳原子的烯基基团,或一个羟基,m是0到3的整数,n是1到4的整数,p是0或1,q是1到100的整数。)