3-(4-Nitrophenyl)propanoate

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 苯丙酸
• 英文名称: 3-(4-Nitrophenyl)propanoate
• 化学式: C9H8NO4-
• 分子量: 194.16
• InChiKey: VZOPVJNBOQOLPN-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  14
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.22
• 拓扑面积：
  86
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• CYCLODEPSIPEPTIDE COMPOUND
  申请人：FUJISAWA PHARMACEUTICAL CO., LTD.

  公开号：EP0718293A1

  公开（公告）日：1996-06-26

  A compound of the formula : wherein Ais benzyl group which has suitable substituent (s), Aa, B and Dare each lower alkyl, Cis hydrogen or lower alkyl, or a salt thereof. The compound or its salt of the present invention has excellent parasiticidal activities as parasiticides (anthelmintics) for animals and human bodies.

  式中的化合物： 式中 A 是具有适当取代基的苄基、 Aa、B 和 D 均为低级烷基、 顺式氢或低级烷基、 或其盐。 本发明的化合物或其盐作为动物和人体的杀寄生虫剂（驱虫药），具有极佳的杀寄生虫活性。
• PHOTOSENSITIVE COMPOSITION FOR INTERLAYER DIELECTRIC AND METHOD OF FORMING PATTERNED INTERLAYER DIELECTRIC
  申请人：AZ Electronic Materials (Japan) K.K.

  公开号：EP1548499A1

  公开（公告）日：2005-06-29

  There is provided a photosensitive composition which possesses excellent storage stability and can yield an interlayer insulation film with an improved film thickness limit. The photosensitive composition comprises a modified polysilsesquiazane having a weight average molecular weight of 500 to 200,000 comprising basic constitutional units represented by formula -[SiR1(NR2)1.5]- wherein R1's each independently represent an alkyl group having 1 to 3 carbon atoms or a substituted or unsubstituted phenyl group; R2's each independently represent hydrogen, an alkyl group having 1 to 3 carbon atoms, or a substituted or unsubstituted phenyl group, up to 50% by mole of the basic constitutional units having been replaced by a linking group other than the silazane bond; and a photoacid generating agent.

  本发明提供了一种光敏组合物，它具有优异的贮存稳定性，并能产生具有改进的膜厚度极限的层间绝缘膜。该光敏组合物包括一种改性聚硅烷基噻嗪，其重量平均分子量为 500 至 200,000，包含由式-[SiR1(NR2)1.5]-其中 R1 各自独立地代表具有 1 至 3 个碳原子的烷基或取代或未取代的苯基；R2 各自独立地代表氢、具有 1 至 3 个碳原子的烷基或取代或未取代的苯基，以摩尔计最多有 50%的基本构型单元被硅烷键以外的连接基团取代；以及一种光酸生成剂。
• Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric
  申请人：Nagahara Tatsuro

  公开号：US20060160014A1

  公开（公告）日：2006-07-20

  A change in dimension of a pattern formed of a polysilsesquiazane photosensitive composition containing a photoacid generating agent is prevented. The photosensitive composition according to the present invention is characterized by comprising: a modified polysilsesquiazane having a weight average molecular weight of 500 to 200,000 comprising basic constitutional units represented by formula —[SiR 1 (NR 2 ) 1.5 ]— wherein R 1 's each independently represent an alkyl group having 1 to 3 carbon atoms or a substituted or unsubstituted phenyl group; R 2 's each independently represent hydrogen, an alkyl group having 1 to 3 carbon atoms, or a substituted or unsubstituted phenyl group, up to 50% by mole of said basic constitutional units having been replaced by a linking group other than the silazane bond; a photoacid generating agent; and a basic material.

  防止含有光酸生成剂的聚硅烷基噻嗪光敏组合物形成的图案尺寸发生变化。根据本发明的光敏组合物，其特征在于包含：一种改性聚硅烷基噻嗪，其重量平均分子量为 500 至 200,000 之间，包含由式-[SiR 1 (NR 2 ) 1.5 其中 R 1 各自独立地代表具有 1 至 3 个碳原子的烷基或取代或未取代的苯基；R 2 各自独立地代表氢、具有 1 至 3 个碳原子的烷基或取代或未取代的苯基，最多 50%（摩尔）的所述基本结构单元被硅烷键以外的连接基团取代；一种光酸生成剂；以及一种碱性材料。
• DERIVES PHENYLIQUES ET LEUR UTILISATION COMME MEDICAMENT
  申请人：IPSEN PHARMA S.A.S.

  公开号：EP2102162A1

  公开（公告）日：2009-09-23
• US5709867A
  申请人：——

  公开号：US5709867A

  公开（公告）日：1998-01-20